Paper
30 November 1994 High-temperature-resistant gratings for moire interferometry
Colin Forno
Author Affiliations +
Proceedings Volume 2342, Interferometry '94: Photomechanics; (1994) https://doi.org/10.1117/12.195508
Event: International Conference on Interferometry '94, 1994, Warsaw, Poland
Abstract
A simple technique, based on metallized photoresist gratings, offers a method of using moire interferometry on components which are subjected to high temperatures. The approach has been used to measure residual stresses in components by the process of annealing.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Colin Forno "High-temperature-resistant gratings for moire interferometry", Proc. SPIE 2342, Interferometry '94: Photomechanics, (30 November 1994); https://doi.org/10.1117/12.195508
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Cited by 3 scholarly publications.
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KEYWORDS
Moire patterns

Metals

Deflectometry

Polishing

Annealing

Fringe analysis

Surface finishing

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