Paper
19 August 1998 Makyoh-topography studies of mirrorlike surfaces: toward a quantitative understanding
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Proceedings Volume 3573, OPTIKA '98: 5th Congress on Modern Optics; (1998) https://doi.org/10.1117/12.320948
Event: OPTIKA '98: Fifth Congress on Modern Optics, 1998, Budapest, Hungary
Abstract
A quantitative approach to the Makyoh-topography image formation mechanism is presented. General relations are given on the optical settings. Then, optical ray-tracing simulations of an isolated defect (hillock or depression) and a periodic (sinusoidal) surface are presented for different optical settings. Optimum working conditions are established, and general features of the imaging are pointed out. Supporting experimental images of semiconductor samples are shown.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ferenc Riesz "Makyoh-topography studies of mirrorlike surfaces: toward a quantitative understanding", Proc. SPIE 3573, OPTIKA '98: 5th Congress on Modern Optics, (19 August 1998); https://doi.org/10.1117/12.320948
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KEYWORDS
Lawrencium

Monte Carlo methods

Light sources

Cameras

Imaging systems

Semiconducting wafers

Geometrical optics

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