Framework for identifying recommended rules and DFM scoring model to improve manufacturability of sub-20nm layout design

Piyush Pathak; Sriram Madhavan; Shobhit Malik; Lynn T.-N. Wang; Luigi Capodieci

doi:10.1117/12.916288

14 March 2012 Framework for identifying recommended rules and DFM scoring model to improve manufacturability of sub-20nm layout design

Piyush Pathak, Sriram Madhavan, Shobhit Malik, Lynn T.-N. Wang, Luigi Capodieci

Author Affiliations +

Proceedings Volume 8327, Design for Manufacturability through Design-Process Integration VI; 83270U (2012) https://doi.org/10.1117/12.916288
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

This paper addresses the framework for building critical recommended rules and a methodology for devising scoring models using simulation or silicon data. Recommended rules need to be applied to critical layout configurations (edge or polygon based geometric relations), which can cause yield issues depending on layout context and process variability. Determining of critical recommended rules is the first step for this framework. Based on process specifications and design rule calculations, recommended rules are characterized by evaluating the manufacturability response to improvements in a layout-dependent parameter. This study is applied to critical 20nm recommended rules. In order to enable the scoring of layouts, this paper also discusses a CAD framework involved in supporting use-models for improving the DFM-compliance of a physical design.

Citation Download Citation

Piyush Pathak, Sriram Madhavan, Shobhit Malik, Lynn T.-N. Wang, and Luigi Capodieci "Framework for identifying recommended rules and DFM scoring model to improve manufacturability of sub-20nm layout design", Proc. SPIE 8327, Design for Manufacturability through Design-Process Integration VI, 83270U (14 March 2012); https://doi.org/10.1117/12.916288

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