Dr. Lynn T. N. Wang Profile

Dr. Lynn T. N. Wang

at GlobalFoundries

SPIE Involvement:

Conference Program Committee | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author

Publications (26)

Proceedings Article | 11 April 2024 Presentation + Paper

In-design DFM pattern optimization with ML models for dynamic fixing guidance selection and implementation

Fadi Batarseh, Piyush Pathak, Jac Condella, Keerthana Bhoopanam, Jeff Nelson, Lynn Wang, Ya-Chieh Lai

Proceedings Volume 12954, 1295406 (2024) https://doi.org/10.1117/12.3023887

KEYWORDS: Design for manufacturing, Design, Machine learning, Mathematical optimization, Manufacturing, Design for manufacturability, Education and training, Process modeling, Histograms, Electronic design automation

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Proceedings Article | 11 April 2024 Presentation + Paper

Pattern-based in-design fixing for improving design for manufacturability (DFM) rule compliance

Lynn T. Wang, Ariel de Jesus Reyes Ruiz, Teodora Nicolae, Ivan Tanev, Klaus-Peter Johnsen, David Villarreal, Fadi Batarseh

Proceedings Volume 12954, 1295410 (2024) https://doi.org/10.1117/12.3010901

KEYWORDS: Design for manufacturing, Metals, Design, Design rules, Manufacturing, Optical proximity correction, Image classification, Automation, Compliance, Design for manufacturability

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Proceedings Article | 28 April 2023 Presentation + Paper

Machine learning architecture evaluation for fast and accurate weak point detection

Yi Lee, Uwe Paul Schroeder, Pouya Rezaeifakhr, Lynn Wang, David Villarreal

Proceedings Volume 12495, 1249519 (2023) https://doi.org/10.1117/12.2657156

KEYWORDS: Design and modelling, Design for manufacturing, Design rules, Machine learning, Data modeling, Statistical modeling, Statistical analysis, Chip manufacturing

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Proceedings Article | 28 April 2023 Presentation + Paper

Design for manufacturability (DFM) physical verification using machine learning

Lynn T. Wang, Klaus-Peter Johnsen, Ivan Tanev, Fadi Batarseh, Chang Su, Pouya Rezaeifakhr, Uwe Paul Schroeder

Proceedings Volume 12495, 124951G (2023) https://doi.org/10.1117/12.2658646

KEYWORDS: Data modeling, Machine learning, Neural networks, Design and modelling, Design for manufacturing, Principal component analysis, Correlation coefficients, Singular value decomposition, Mathematical optimization, Lithography

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Proceedings Article | 28 April 2023 Presentation + Paper

Design for manufacturability (DFM) in-design fixing for improving manufacturability aware scoring (MAS)

Ariel De Jesus Reyes Ruiz, Lynn T. Wang, Fadi Batarseh, Uwe Paul Schroeder

Proceedings Volume 12495, 124950V (2023) https://doi.org/10.1117/12.2659397

KEYWORDS: Design and modelling, Design for manufacturing, Design rules, Manufacturing, Library classification systems, Image classification, Design for manufacturability, Yield improvement, Target detection, Profiling

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Proceedings Article | 26 May 2022 Presentation + Paper

Retargeting-aware design for manufacturability (DFM) checks using machine learning

Lynn T. Wang, Uwe Paul Schroeder, Punitha Selvam, Fadi Batarseh, Pouya Rezaeifakhr, Ariel de Jesus Reyes, Teodora Nicolae, Ivan Tanev, Sriram Madhavan

Proceedings Volume 12052, 1205211 (2022) https://doi.org/10.1117/12.2614460

KEYWORDS: Design for manufacturing, Machine learning, Feature extraction, Metals, Computer aided design, Data modeling, Manufacturing, Neural networks, Design for manufacturability, Data processing

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Proceedings Article | 22 February 2021 Presentation + Paper

Electrical design-for-manufacturability (DFM) checks for reducing layout-induced circuit variability of analog designs

Lynn Wang, Michael Simcoe, Vikas Mehrotra, Rais Huda, Zhao Chuan Lee, Thomas McKay, Uwe Paul Schroeder, Sriram Madhavan

Proceedings Volume 11614, 116140L (2021) https://doi.org/10.1117/12.2583839

KEYWORDS: Analog electronics, Design for manufacturing, Metals, Resistance, Capacitance, Databases, Back end of line, Tolerancing, Mirrors, Manufacturing

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Proceedings Article | 23 March 2020 Presentation + Paper

Co-optimizing DFM enhancements and their impact on layout-induced circuit performance for analog designs

Lynn Wang, Michael Simcoe, Vikas Mehrotra, Gail Katzman, Rais Huda, Zhao Chuan Lee, Janam Bakshi, Ahmed Abdulghany, Uwe Paul Schroeder, Sriram Madhavan

Proceedings Volume 11328, 113280M (2020) https://doi.org/10.1117/12.2551945

KEYWORDS: Design for manufacturing, Analog electronics, Databases, Device simulation, Metals, Manufacturing, Transistors, Mirrors, Design for manufacturability, Amplifiers

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Proceedings Article | 20 March 2019 Presentation + Paper

Design for manufacturability for analog, radio frequency, and millimeter wave designs

Lynn Wang, Gail Katzman, Yongfu Li, Vikas Mehrotra, Janam Bakshi, Ahmed Abdulghany, Michael Simcoe, Rais Huda, Zhao Chuan Lee, Don Blackwell, Thomas Hermann, Uwe Paul Schroeder, Thomas McKay, Sriram Madhavan

Proceedings Volume 10962, 109620G (2019) https://doi.org/10.1117/12.2514769

KEYWORDS: Design for manufacturing, Analog electronics, Manufacturing, Chemical mechanical planarization, Design for manufacturability, Metals, Extremely high frequency, Yield improvement, Digital electronics, Transceivers

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Proceedings Article | 20 March 2018 Presentation + Paper

Post-decomposition optimizations using pattern matching and rule-based clustering for multi-patterning technology

Lynn T.-N. Wang, Sriram Madhavan

Proceedings Volume 10588, 105880C (2018) https://doi.org/10.1117/12.2297508

KEYWORDS: Design for manufacturing, Manufacturing, Metals, Photomasks, Double patterning technology, Design for manufacturability, Lithography, Optical lithography, Yield improvement

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Proceedings Article | 30 March 2017 Presentation + Paper

Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for sub-20nm metal routing

Lynn T. - Wang, Uwe Paul Schroeder, Sriram Madhavan

Proceedings Volume 10148, 1014804 (2017) https://doi.org/10.1117/12.2258061

KEYWORDS: Metals, Photomasks, Lithography, Manufacturing, Double patterning technology, Design for manufacturing, Design for manufacturability, Capacitance, Printing, Computer simulations, Computer aided design, Optical lithography

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Proceedings Article | 16 March 2016 Paper

Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond

Lynn Wang, Uwe Paul Schroeder, Youngtag Woo, Jia Zeng, Sriram Madhavan, Luigi Capodieci

Proceedings Volume 9781, 97810B (2016) https://doi.org/10.1117/12.2219358

KEYWORDS: Photomasks, Manufacturing, Lithography, Double patterning technology, Metals, Image classification, Library classification systems, Design for manufacturing, Design for manufacturability, Overlay metrology, Optical proximity correction, 193nm lithography

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Proceedings Article | 18 March 2015 Paper

A pattern-based methodology for optimizing stitches in double-patterning technology

Lynn Wang, Sriram Madhavan, Vito Dai, Luigi Capodieci

Proceedings Volume 9427, 942704 (2015) https://doi.org/10.1117/12.2085955

KEYWORDS: Image classification, Manufacturing, Lithography, Double patterning technology, Bismuth, Library classification systems, Metals, Photomasks, Overlay metrology, Design for manufacturability

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Proceedings Article | 28 March 2014 Paper

Decomposition-aware layout optimization for 20/14nm standard cells

Lynn T. Wang, Sriram Madhavan, Shobhit Malik, Eric Chiu, Luigi Capodieci

Proceedings Volume 9053, 90530W (2014) https://doi.org/10.1117/12.2046147

KEYWORDS: Manufacturing, Photomasks, Metals, Composites, Silicon, Double patterning technology, Standards development, Resistance, Resolution enhancement technologies, Design for manufacturability

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Proceedings Article | 29 March 2013 Paper

Pattern matching for identifying and resolving non-decomposition-friendly designs for double patterning technology (DPT)

Lynn T. Wang, Vito Dai, Luigi Capodieci

Proceedings Volume 8684, 868409 (2013) https://doi.org/10.1117/12.2011690

KEYWORDS: Double patterning technology, Lithography, Resolution enhancement technologies, Metals, Design for manufacturability, Manufacturing, Visualization, Optical proximity correction, Chemical mechanical planarization, Projection systems

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Proceedings Article | 15 March 2012 Paper

A scoring methodology for quantitatively evaluating the quality of double patterning technology-compliant layouts

Lynn Wang, Sriram Madhavan, Shobhit Malik, Piyush Pathak, Luigi Capodieci

Proceedings Volume 8327, 832718 (2012) https://doi.org/10.1117/12.916494

KEYWORDS: Photomasks, Composites, Double patterning technology, Capacitance, Chromium, Optical lithography, Lithography, Manufacturing, Metals, Resolution enhancement technologies

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Proceedings Article | 15 March 2012 Paper

Framework for identifying recommended rules and DFM scoring model to improve manufacturability of sub-20nm layout design

Piyush Pathak, Sriram Madhavan, Shobhit Malik, Lynn Wang, Luigi Capodieci

Proceedings Volume 8327, 83270U (2012) https://doi.org/10.1117/12.916288

KEYWORDS: Design for manufacturing, Computer aided design, Metals, Monte Carlo methods, Silicon, Manufacturing, Solid modeling, Failure analysis, Image processing, Computer simulations

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Proceedings Article | 15 March 2012 Paper

Pattern matching for double patterning technology-compliant physical design flows

Lynn Wang, Vito Dai, Luigi Capodieci

Proceedings Volume 8327, 832708 (2012) https://doi.org/10.1117/12.916581

KEYWORDS: Double patterning technology, Manufacturing, Design for manufacturability, Resolution enhancement technologies, Lithography, Optical proximity correction, Feature extraction, Projection systems, Current controlled current source, Fourier transforms

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Proceedings Article | 19 May 2011 Paper

Collaborative research on emerging technologies and design

Andrew Neureuther, Juliet Rubinstein, Marshal Miller, Kenji Yamazoe, Eric Chin, Cooper Levy, Lynn Wang, Nuo Xu, Costas Spanos, Kun Qian, Kameshwar Poolla, Justin Ghan, Anand Subramanian, Tsu-Jae King Liu, Xin Sun, Kwangok Jeong, Puneet Gupta, Abde Kaqalwalla, Rani Ghaida, Tuck Boon Chan

Proceedings Volume 8081, 80810N (2011) https://doi.org/10.1117/12.899394

KEYWORDS: Photomasks, Double patterning technology, Lithography, Image processing, Line edge roughness, Algorithm development, Reticles, Inspection, Design for manufacturing, Device simulation

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Proceedings Article | 3 April 2010 Paper

45nm-generation parameter-specific ring oscillator monitors

Lynn T.-N. Wang, Nuo Xu, Tsu-Jae King Liu, Andrew Neureuther

Proceedings Volume 7641, 76410N (2010) https://doi.org/10.1117/12.846719

KEYWORDS: Device simulation, Photovoltaics, Etching, Lithography, Oscillators, Semiconducting wafers, Overlay metrology, CMOS technology, Data modeling, Computer aided design

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Proceedings Article | 13 March 2009 Paper

Parameter-specific electronic measurement and analysis of sources of variation using ring oscillators

Lynn T.-N. Wang, Liang-Teck Pang, Andrew Neureuther, Borivoje Nikolić

Proceedings Volume 7275, 72750L (2009) https://doi.org/10.1117/12.814227

KEYWORDS: Oscillators, Diffusion, Lithography, Etching, Structural design, Transistors, Visualization, Photomasks, Capacitance, Capacitors

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Proceedings Article | 13 March 2009 Paper

Illustration of illumination effects on proximity, focus spillover, and design rules

Lynn Wang, Anthony Yeh, Lilly Kem, Andrew Neureuther

Proceedings Volume 7275, 72750B (2009) https://doi.org/10.1117/12.814222

KEYWORDS: Photomasks, Lithographic illumination, Fourier transforms, Binary data, Visualization, Monochromatic aberrations, Transmittance, Convolution, Spherical lenses, Superposition

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Proceedings Article | 18 March 2008 Paper

Hypersensitive parameter-identifying ring oscillators for lithography process monitoring

Lynn Wang, Wojtek Poppe, Liang-Teck Pang, Andrew Neureuther, Elad Alon, Borivoje Nikolic

Proceedings Volume 6925, 69250P (2008) https://doi.org/10.1117/12.773184

KEYWORDS: Oscillators, Lithography, Device simulation, Design for manufacturing, Transistors, Phase shifts, Semiconducting wafers, Instrument modeling, Manufacturing, Circuit switching

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Proceedings Article | 18 March 2008 Paper

Process variation in metal-oxide-metal (MOM) capacitors

Lynn Wang

Proceedings Volume 6925, 69251M (2008) https://doi.org/10.1117/12.773197

KEYWORDS: Capacitors, Capacitance, Lithography, Tolerancing, Lithographic illumination, Image processing, Feature extraction, Integrated circuits, Visualization, Signal processing

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Proceedings Article | 16 November 2007 Paper

Lateral interactions between standard cells using pattern matching

Lynn Tao-Ning Wang, Andrew Neureuther

Proceedings Volume 6730, 673010 (2007) https://doi.org/10.1117/12.746758

KEYWORDS: Metals, Standards development, Fourier transforms, Lithography, Calibration, Microelectronics, Transistors, Photomasks, Visualization, Optical proximity correction

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Proceedings Article | 28 March 2007 Open Access

Collaborative platform, tool-kit, and physical models for DfM

Andy Neureuther, Wojtek Poppe, Juliet Holwill, Eric Chin, Lynn Wang, Jae-Seok Yang, Marshal Miller, Dan Ceperley, Chris Clifford, Koji Kikuchi, Jihong Choi, Dave Dornfeld, Paul Friedberg, Costas Spanos, John Hoang, Jane Chang, Jerry Hsu, David Graves, Alan Wu, Mike Lieberman

Proceedings Volume 6521, 652104 (2007) https://doi.org/10.1117/12.721199

KEYWORDS: Design for manufacturing, Photomasks, Device simulation, Computer aided design, Process modeling, Etching, Monochromatic aberrations, Manufacturing, Lithography, Chemical mechanical planarization

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