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Ainijiang Atawula
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Publications (1)
Proceedings Article | 17 May 2019 Paper
Application of femtosecond frequency combs in the measurement of film thickness
A. Ainijiang, A. Abuduresuli
Proceedings Volume 11170, 111700Z (2019) https://doi.org/10.1117/12.2532673
KEYWORDS: Silicon, Semiconducting wafers, Femtosecond phenomena, Wafer-level optics, Interferometers, Silicon films, Semiconductor lasers, Distance measurement, Femtosecond frequency combs, Pulsed laser operation
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NON-SPIE: Application of femtosecond frequency combs in the Measuerment of Film thickness
In this paper, a method to measure the thickness of TiO2 is developed based on the Micklson interferometer. Through a spectral domain analysis of multiple interferograms obtained using a femtosecond pulse laser, accroding to the interferance signals
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