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Anda Elena Grigorescu
PhD Student at Technische Univ Delft
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Publications (3)
SPIE Journal Paper | 1 January 2008
High-dose exposure of silicon in electron beam
Anda Grigorescu, Marco van der Krogt, Emile van der Drift, Cees Hagen
JM3, Vol. 7, Issue 01, 013005, (January 2008) https://doi.org/10.1117/12.10.1117/1.2841716
KEYWORDS: Etching, Silicon, Electron beam lithography, Reactive ion etching, Carbon, Oxides, Dry etching, Semiconducting wafers, X-rays, Photoemission spectroscopy
SPIE Journal Paper | 1 October 2007
Limiting factors for electron beam lithography when using ultra-thin hydrogen silsesquioxane layers
Anda Grigorescu, Marco van der Krogt, Cees Hagen
JM3, Vol. 6, Issue 04, 043006, (October 2007) https://doi.org/10.1117/12.10.1117/1.2816459
KEYWORDS: Electron beam lithography, Electron beams, Scanning electron microscopy, Hydrogen, Silicon, Photoresist processing, Polymers, Semiconducting wafers, Photomicroscopy, Nanolithography
Proceedings Article | 22 March 2007 Paper
Sub-10-nm structures written in ultra-thin HSQ resist layers using electron-beam lithography
Anda Grigorescu, Marco van der Krogt, Cees Hagen
Proceedings Volume 6519, 65194A (2007) https://doi.org/10.1117/12.725851
KEYWORDS: Electron beams, Electron beam lithography, Photoresist processing, Silicon, Polymers, Lithography, Scattering, Scanning electron microscopy, Laser scattering, Molecules
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