Mr. Andrew Thompson Profile

Andrew Thompson

President at DisChem Inc

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Author

Publications (4)

Proceedings Article | 25 March 2019 Paper

Charge dissipation by use of a novel aqueous based quaternary ammonium compound for use in electron beam lithography on non-conductive substrates

Gerald Lopez, Glen de Villafranca, Grant Shao, Meiyue Zhang, Andrew Thompson

Proceedings Volume 10960, 1096027 (2019) https://doi.org/10.1117/12.2524294

KEYWORDS: Electron beam direct write lithography, Electron beam lithography, Metals, Polymers, Silica, Nanotechnology, Polymer thin films, Gold, Silicon, Thin film coatings, Glasses

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Proceedings Article | 27 March 2014 Paper

Improved adhesion of novolac and epoxy based resists by cationic organic materials on critical substrates for high volume patterning applications

Anja Voigt, Gisela Ahrens, Marina Heinrich, Andrew Thompson, Gabi Gruetzner

Proceedings Volume 9051, 90511K (2014) https://doi.org/10.1117/12.2046258

KEYWORDS: Silicon, Epoxies, Optical lithography, Photoresist processing, Electroplating, Nickel, Head-mounted displays, Copper, Silica, Glasses

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Proceedings Article | 29 March 2013 Paper

Electron dose reduction through improved adhesion by cationic organic material with HSQ resist on an InGaAs multilayer system on GaAs substrate

Wilfried Erfurth, Andrew Thompson, Nezih Ünal

Proceedings Volume 8682, 86821Z (2013) https://doi.org/10.1117/12.2018121

KEYWORDS: Gallium arsenide, Indium gallium arsenide, Electron beam lithography, Photoresist processing, Reactive ion etching, Near field scanning optical microscopy, Manufacturing, Scanning electron microscopy, Organic materials, Scattering

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Proceedings Article | 19 March 2012 Paper

Reduced Zeta potential through use of cationic adhesion promoter for improved resist process performance and minimizing material consumption

Lorna Hodgson, Andrew Thompson

Proceedings Volume 8325, 83251W (2012) https://doi.org/10.1117/12.917856

KEYWORDS: Polymers, Semiconducting wafers, Photoresist materials, Silicon, Thin film coatings, Manufacturing, Coating, Photoresist processing, X-rays, Lithography

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