Silicon nanocrystals embedded in silicon dioxide matrices have exhibited optical gain in the visible region when pumped by a laser source, but to be commercially viable in laser applications and integration into microelectronics, emission has to be electrically stimulated rather than optically pumped. Superlattices of silicon and different non-silicon oxides were fabricated by pulsed laser deposition and subsequent rapid thermal annealing in inert atmosphere to obtain nanocrystalline silicon embedded in crystalline oxide layers. High resolution transmission electron microscopy was used to detect presence of silicon nanocrystals embedded in a silicon dioxide matrix. Reported in this letter are silicon nanocrystals with size from 3 nm to 7 nm obtained in Si/YSZ superlattices.
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