By combining inclined pulsed-laser deposition (PLD) with nanoimprint lithography, an original three-dimensional (3D) nanofabrication technique, namely “3D nanotemplate PLD technique E has been established. 3D nanotemplate PLD enables to fabricate the large arrays of programmable ZnO nanostructures: nanoboxes and nanowires with a width of 20nm. Cathodoluminescence (CL) measurements at 300K showed an intense luminescence peak around 380 nm corresponding to near-band-edge (NBE) emission from even a single ZnO nanobox. The CL intensity mapping also showed the brilliant NBE luminescence from the entire single ZnO nanobox. The architecturally designed ZnO nanostructures with an excellent wide-gap luminescent semiconductor character should be good candidates for optoelectronic materials for nanoscale device applications.
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