Bruce A. Auches
Director, Advanced Manufacturing
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 5 November 2005 Paper
Proceedings Volume 5992, 59920V (2005) https://doi.org/10.1117/12.633167
KEYWORDS: Spatial light modulators, Binary data, Deep ultraviolet, Neodymium, Electron beam lithography, Calibration, Data conversion, Overlay metrology, Critical dimension metrology, Photoresist processing

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617359
KEYWORDS: Neodymium, Photomasks, Spatial light modulators, Deep ultraviolet, Electron beam lithography, Optical alignment, Quartz, Optical lithography, Chromium, Critical dimension metrology

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