CONFERENCE PROCEEDINGS
Advanced Search
Béatrice Hémard
at Univ Grenoble Alpes
SPIE Involvement:
Author
Publications (2)
SPIE Journal Paper | 12 June 2023
Electron beam direct write lithography: the versatile ally of optical lithography
Fabien Laulagnet, Jacques-Alexandre Dallery, Laurent Pain, Michael May, Béatrice Hémard, Franck Garlet, Isabelle Servin, Chiara Sabbione
JM3, Vol. 22, Issue 04, 041404, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041404
KEYWORDS: Electron beam direct write lithography, Lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Optical alignment, Photoresist processing, Design and modelling, Overlay metrology, Silicon
Proceedings Article | 1 May 2023 Presentation + Paper
E-beam direct write lithography: the versatile ally of optical lithography
Fabien Laulagnet, Jacques-Alexandre Dallery, Laurent Pain, Michael May, Beatrice Hémard, Franck Garlet, Isabelle Servin, Chiara Sabbione
Proceedings Volume 12497, 1249706 (2023) https://doi.org/10.1117/12.2658273
KEYWORDS: Electron beam direct write lithography, Lithography, Semiconducting wafers, Electron beam lithography, Optical alignment, Overlay metrology, Optical lithography, Design and modelling, Photoresist processing, Deep ultraviolet
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top