Mr. Chang-Young Jeong Profile

Chang-Young Jeong

at MagnaChip Semiconductor Ltd

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 20 March 2006 Paper

Effect of lens aberrations on OPC model accuracy for low k1 lithography process

Jun-Kyu Ahn, Chang-Young Jeong, Jeong-Lyeol Park, Jae-Sung Choi, Jeong-Gun Lee

Proceedings Volume 6154, 615432 (2006) https://doi.org/10.1117/12.656136

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Lithography, Printing, Data modeling, Yield improvement, Phase shifts, Monochromatic aberrations, Semiconductors, Control systems

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Proceedings Article | 12 May 2005 Paper

The analysis of the criteria of phase error by evaluating the influence of lens aberration on the lithographic performance

Chang-Young Jeong, Jun-Kyu Ahn, Ki-Yeop Park, Jae Choi, Jeong Lee

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600418

KEYWORDS: Photomasks, Error analysis, Critical dimension metrology, Lithography, Optical lithography, Monochromatic aberrations, Optical proximity correction, Phase shifts, Interferometers, Semiconductors

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Proceedings Article | 28 May 2004 Paper

The evaluation of assist feature defect printability for sub-0.13-μm technology

Chang-Young Jeong, Young Kim, Ki-Yeop Park, Jae Choi, Jeong Lee

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536115

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Optical proximity correction, Inspection, Printing, Scanning electron microscopy, Photography, Semiconductors, Distortion

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Proceedings Article | 28 May 2004 Paper

The study of contact hole MEEF and defect printability

Chang-Young Jeong, Yeon Hwa Lim, Hong Ik Kim, Jeong Lyeol Park, Jae Sung Choi, Jeong Gun Lee

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536252

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Chromium, Optical lithography, Semiconductors, Lithographic illumination, Inspection, Cadmium, Integrated circuits

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Proceedings Article | 26 June 2003 Paper

Impact of mask defect in a high MEEF process

Chang-Young Jeong, Ki-Yeop Park, Jae-Sung Choi, Jeong-Gun Lee, Dai-Hoon Lee

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485514

KEYWORDS: Photomasks, Critical dimension metrology, Lithium, Chromium, Nanoimprint lithography, Inspection, Semiconductors, Optical lithography, Semiconducting wafers, Lithographic illumination

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Proceedings Article | 2 June 2003 Paper

Optimization of align marks and overlay targets in VIA first dual damascene process

Dae-Ung Shin, Young-Bae Jeong, Jeong-Lyeol Park, Jae-Sung Choi, Jeong-Gun Lee, Dae-Hoon Lee

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485032

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Photoresist materials, Copper, Image processing, Light sources, Coating, Dielectrics, Optical lithography

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Proceedings Article | 16 July 2002 Paper

CD-SEM calibration with TEM to reduce CD measurement error

Chang-Young Jeong, Joohyoung Lee, Ki-Yeop Park, Won Lee, Dai-Hoon Lee

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473519

KEYWORDS: Critical dimension metrology, Calibration, Transmission electron microscopy, Line edge roughness, Semiconducting wafers, Semiconductors, Silicon, Process control, Standards development, Logic devices

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Proceedings Article | 23 June 2000 Paper

Improvement of resist profile roughness in bilayer resist process

Chang-Young Jeong, Sang-Wook Ryu, Ki-Yeop Park, Won-Kyu Lee, Seung-Woog Lee, Dai-Hoon Lee

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388368

KEYWORDS: Photoresist processing, Critical dimension metrology, Line edge roughness, Image processing, Deep ultraviolet, Optical lithography, Silicon, Etching, Lithography, Reactive ion etching

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Showing 5 of 8 publications

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