Dr. David I. Pearson Profile

Dr. David I. Pearson

Ion Beam Specialist at Oxford Instruments Plasma Technology Ltd

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Publications (6)

Proceedings Article | 12 March 2024 Poster + Paper

Straightforward method for sidewall roughness measurements by AFM on ion beam etched slanted diffraction gratings and their topography development

Paulo Lima, Sebastien Pochon, David Pearson, Sung-Jin Cho

Proceedings Volume 12913, 129131A (2024) https://doi.org/10.1117/12.3000170

KEYWORDS: Atomic force microscopy, Diffraction gratings, Ion beams, Etching, Plasma, Equipment, Silicon, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 29 March 2021 Presentation + Paper

Towards AR waveguides with refractive index 2.0 utilizing nanoimprint lithogrpahy

Martin Eibelhuber, Christine Thanner, Dominik Treiblmayr, Sebastien Pochon, W. Frost, Joao Ferreira, David Pearson, Stephanie Baclet

Proceedings Volume 11765, 117650H (2021) https://doi.org/10.1117/12.2579505

KEYWORDS: Refractive index, Augmented reality, Waveguides, Nanoimprint lithography, Etching, Polymers, Glasses, Nanostructures, Photorefractive polymers, Optics manufacturing

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Proceedings Article | 19 September 2016 Paper

Resistance repeatability study of ion-beam deposited vanadium oxide thin films

P. Alvarez, D. I. Pearson, S. Pochon, O. Thomas, M. Cooke, R. Gunn

Proceedings Volume 9974, 997415 (2016) https://doi.org/10.1117/12.2248262

KEYWORDS: Oxidation, Resistance, Vanadium, Oxides, Ion beams, Sputter deposition, Thin film deposition, Thin films, Oxygen, Semiconducting wafers

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Proceedings Article | 26 September 2013 Paper

Contamination control in ion beam sputter-deposited films

David I. Pearson, Sebastien Pochon, Mike Cooke

Proceedings Volume 8816, 88161K (2013) https://doi.org/10.1117/12.2025534

KEYWORDS: Contamination, Ion beams, Sputter deposition, Ions, Argon, Etching, Silica, Metals, Xenon, Thin films

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Proceedings Article | 9 July 2003 Paper

Use of asymmetric dual-cavity filters to track small H and L variations as a tool to increase yield of DWDM filters

David Pearson, Paul Luff, Mervyn Davis, Arthur Howe

Proceedings Volume 4998, (2003) https://doi.org/10.1117/12.475756

KEYWORDS: Dense wavelength division multiplexing, Coating, Optical filters, Calibration, Ion beams, Sputter deposition, Optics manufacturing, Laser optics, Electronic filtering, Absorption

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Proceedings Article | 16 April 1993 Paper

MORI (TM) high-density rf plasma source etching of polysilicon and metal films on wafers

Gregor Campbell, Alexis de Chambrier, Frank Mendoza, N. William Parker, David Pearson, Ken Tokunaga, Tsutomu Tsukada, Supika Mashiro, H. Nogami

Proceedings Volume 1803, (1993) https://doi.org/10.1117/12.142916

KEYWORDS: Etching, Semiconducting wafers, Plasma, Plasma etching, Oxides, Photoresist materials, Chlorine, Anisotropic etching, Metals, Ions

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Showing 5 of 6 publications

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