Daniel J. Williams
Development Eng Manager
SPIE Involvement:
Author | Instructor
Publications (5)

Proceedings Article | 29 March 2006 Paper
Dan Miller, Adrian Salinas, Joel Peterson, David Vickers, Dan Williams
Proceedings Volume 6153, 615336 (2006) https://doi.org/10.1117/12.656832
KEYWORDS: Semiconducting wafers, Cadmium sulfide, Standards development, Data modeling, Lithography, Manufacturing, Computer programming, Critical dimension metrology, Systems modeling, Thin film coatings

Proceedings Article | 29 March 2006 Paper
Proceedings Volume 6153, 615333 (2006) https://doi.org/10.1117/12.659235
KEYWORDS: Semiconducting wafers, Temperature metrology, Control systems, Critical dimension metrology, Photoresist processing, Diffractive optical elements, Lithography, Control systems design, Data modeling, Wafer testing

Proceedings Article | 12 June 2003 Paper
Arunn Narasimhan, Natarajan Ramanan, Daniel Williams
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485199
KEYWORDS: Semiconducting wafers, 3D modeling, Thermal modeling, Performance modeling, Optical lithography, Numerical simulations, Temperature metrology, Thermal analysis, Ear, Thermal effects

Proceedings Article | 14 August 1997 Paper
Kevin Kemp, Daniel Williams, Joseph Cayton, Peter Steege, Steve Slonaker, Richard Elliott
Proceedings Volume 3183, (1997) https://doi.org/10.1117/12.280551
KEYWORDS: Lithography, Deep ultraviolet, Manufacturing, Semiconductor manufacturing, Semiconductors, Chemically amplified resists, Performance modeling, Semiconducting wafers, Temperature metrology, Photoresist materials

Proceedings Article | 7 July 1997 Paper
Kevin Kemp, Daniel Williams, Joseph Cayton, Peter Steege, Steve Slonaker, Richard Elliott
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275895
KEYWORDS: Lithography, Deep ultraviolet, Manufacturing, Semiconductor manufacturing, Semiconductors, Chemically amplified resists, Performance modeling, Semiconducting wafers, Temperature metrology, Photoresist materials

Course Instructor
SC780: Tracks 101: Microlithography Coat and Develop Basics
This course provides attendees with a introductory to intermediate working knowledge of microlithography coat and develop or "track" processes. "Track" is the industry jargon for the equipment used to deposit photoresist and subsequently develop the image after the substrate has been exposed. The course provides insight on process, equipment setup, and troubleshooting, focusing mainly on the hardware and the hardware's impact on the process results. You will become fluent with "track" parameters for many varied applications, and many practical and useful examples are included throughout.
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top