Ms. Diane M. Keil Profile

Diane M. Keil

Process Engineering Intern at Broadcom Inc

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Publications (1)

Proceedings Article | 6 December 2004 Paper

Qualifying OPC model robustness to reticle noise errors and FAB process changes

Diane Keil, Nadya Belova, John Jensen, Neal Callan

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569580

KEYWORDS: Optical proximity correction, Reticles, Data modeling, Logic, Semiconducting wafers, Performance modeling, Lithography, Image processing, Tolerancing, Scanning electron microscopy

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