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Dong-Gyun Kim
at Seoul National Univ
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Publications (1)
Proceedings Article | 27 March 2014 Paper
ArF photoresist polymers with nitrogen or sulfone moieties for negative tone development process
Dong-Gyun Kim, Su-Jee Kwon, Suk-Koo Hong, Joon Je Lee, Hyung Rae Lee, Hyo-jin Yun, Ji-Hoon Baik, Dohyuk Im, Eujean Jang, Jae-Woo Lee, Jae-Hyun Kim, Jong-Chan Lee
Proceedings Volume 9051, 905126 (2014) https://doi.org/10.1117/12.2048674
KEYWORDS: Polymers, Photoresist materials, Lithography, Photoresist developing, Nitrogen, Particle swarm optimization, Polymerization, Photoresist processing, Scanning electron microscopy, Etching
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