Ms. Ellyn Yang Profile

Ellyn Yang

Principle Engineer at Semiconductor Manufacturing International Corp

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 18 March 2015 Paper

OPC solution by implementing fast converging methodology

Qing Yang, Yaojun Du

Proceedings Volume 9426, 94261V (2015) https://doi.org/10.1117/12.2085304

KEYWORDS: Optical proximity correction, Semiconducting wafers, Detection and tracking algorithms, Semiconductor manufacturing, Lithography, Etching, Resolution enhancement technologies, Printing, Model-based design, Photomasks

Read Abstract +

Proceedings Article | 25 September 2010 Paper

An optimized OPC and MDP flow for reducing mask write time and mask cost

Ellyn Yang, Cheng He Li, Se Jin Park, Yu Zhu, Eric Guo

Proceedings Volume 7823, 78233E (2010) https://doi.org/10.1117/12.864790

KEYWORDS: Optical proximity correction, Photomasks, Logic, Metals, Resolution enhancement technologies, Model-based design, Semiconducting wafers, Optical lithography, Databases, Logic devices

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Model-based retarget for 45nm node and beyond

Ellyn Yang, Cheng He Li, Xiao Hui Kang, Eric Guo

Proceedings Volume 7274, 727428 (2009) https://doi.org/10.1117/12.814085

KEYWORDS: Optical proximity correction, Model-based design, Process modeling, Design for manufacturing, Manufacturing, Optical lithography, Design for manufacturability, Calibration, Semiconductors, Lithography

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years