Dr. Frank Fuchs Profile

Dr. Frank Fuchs

Managing Director at Gitterwerk GmbH

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 4 March 2015 Paper

Sub-700fs pulses at 152 W average power from a Tm-doped fiber CPA system

Christian Gaida, Fabian Stutzki, Martin Gebhardt, Florian Jansen, Andreas Wienke, Uwe Zeitner, Frank Fuchs, Cesar Jauregui, Dieter Wandt, Dietmar Kracht, Jens Limpert, Andreas Tünnermann

Proceedings Volume 9344, 93441K (2015) https://doi.org/10.1117/12.2079056

KEYWORDS: Fiber lasers, Fiber amplifiers, Oscillators, Ultrafast phenomena, Laser systems engineering, Optical amplifiers, Medium wave, Thermal effects, Dielectric polarization, Diffraction

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Proceedings Article | 2 May 2014 Paper

Fast character projection electron beam lithography for diffractive optical elements

Torsten Harzendorf, Frank Fuchs, Michael Banasch, Uwe Zeitner

Proceedings Volume 9130, 91300Y (2014) https://doi.org/10.1117/12.2052229

KEYWORDS: Nanostructures, Electron beam lithography, Antireflective coatings, Diffraction gratings, Electron beams, Nanolithography, Etching, Silica, Chromium, Reactive ion etching

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Proceedings Article | 7 March 2014 Paper

Efficient fabrication of complex nano-optical structures by E-beam lithography based on character projection

Uwe Zeitner, Torsten Harzendorf, Frank Fuchs, Michael Banasch, Holger Schmidt, Ernst-Bernhard Kley

Proceedings Volume 8974, 89740G (2014) https://doi.org/10.1117/12.2040206

KEYWORDS: Vestigial sideband modulation, Electron beam lithography, Lithography, Plasmonics, Nanolithography, Electron beams, Beam shaping, Metamaterials, Fabrication, Gaussian beams

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Proceedings Article | 7 March 2014 Paper

Application of rigorously optimized phase masks for the fabrication of binary and blazed gratings with diffractive proximity lithography

Lorenz Stuerzebecher, Frank Fuchs, Torsten Harzendorf, Stefan Meyer, Uwe Zeitner

Proceedings Volume 8974, 897415 (2014) https://doi.org/10.1117/12.2037245

KEYWORDS: Photomasks, Binary data, Diffraction gratings, Lithography, Electron beam lithography, Diffraction, Optical lithography, Semiconducting wafers, Image processing, Image resolution

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Proceedings Article | 19 February 2014 Paper

High-refractive-index gratings for spectroscopic and laser applications

Uwe Zeitner, Frank Fuchs, E.-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 8995, 899504 (2014) https://doi.org/10.1117/12.2041729

KEYWORDS: Diffraction gratings, Silica, Lithography, Refractive index, Optical design, Atomic layer deposition, Etching, Diffraction, Electron beam lithography, Titanium dioxide

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Proceedings Article | 15 March 2013 Paper

Asymmetric direction selective filter elements based on high-contrast gratings

Stefan Steiner, Stefanie Kroker, Thomas Käsebier, Daniel Voigt, Jörg Fuchs, Frank Fuchs, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 8633, 86330Z (2013) https://doi.org/10.1117/12.2003930

KEYWORDS: Refractive index, Silicon, Optical filters, Diffraction gratings, Picosecond phenomena, Optical design, Diffraction, Silica, Binary data, Semiconductors

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Proceedings Article | 13 September 2012 Paper

High-performance dielectric diffraction gratings for space applications

Uwe Zeitner, Frank Fuchs, E.-Bernhard Kley

Proceedings Volume 8450, 84502Z (2012) https://doi.org/10.1117/12.928286

KEYWORDS: Diffraction gratings, Spectroscopy, Diffraction, Electron beam lithography, Lithography, Dielectric polarization, Dielectrics, Electron beams, Optical design, Laser applications

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Proceedings Article | 23 February 2012 Paper

Diffractive optical elements based on subwavelength high-contrast gratings

Stefanie Kroker, Thomas Käsebier, Thomas Weber, Stefan Steiner, Frank Fuchs, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 8270, 82700P (2012) https://doi.org/10.1117/12.908145

KEYWORDS: Reflectivity, Silicon, Tolerancing, Silica, Modulation, Reflectors, Polarization, Optical components, Diffractive optical elements, Diffraction gratings

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Proceedings Article | 16 February 2012 Paper

Novel direction selective filter elements based on high-contrast gratings

Stefan Steiner, Stefanie Kroker, Thomas Käsebier, Frank Fuchs, Ernst-Bernhard Kley, Andreas Tünnermann

Proceedings Volume 8270, 827007 (2012) https://doi.org/10.1117/12.908184

KEYWORDS: Diffraction gratings, Silicon, Optical filters, Silica, Dielectrics, Dielectric filters, Refractive index, Diffraction, Sensors, Absorption

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Proceedings Article | 15 February 2012 Paper

Submicrometer pattern generation by diffractive mask-aligner lithography

Uwe Zeitner, Lorenz Stuerzebecher, Torsten Harzendorf, Frank Fuchs, Dirk Michaelis

Proceedings Volume 8249, 82490Q (2012) https://doi.org/10.1117/12.909806

KEYWORDS: Photomasks, Lithography, Diffraction, Lithographic illumination, Printing, Micro optics, Collimation, Semiconducting wafers, Fabrication, Electron beam lithography

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Proceedings Article | 15 February 2012 Paper

Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography

Lorenz Stuerzebecher, Torsten Harzendorf, Frank Fuchs, Uwe Zeitner

Proceedings Volume 8249, 82490R (2012) https://doi.org/10.1117/12.908737

KEYWORDS: Photomasks, Diffraction, Semiconducting wafers, Lithography, Electron beam lithography, Diffraction gratings, Image processing, Reactive ion etching, Scanning electron microscopy, Submicron lithography

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Showing 5 of 11 publications

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