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Garry J. Bordonaro
Photolithographic Engineer at Cornell NanoScale Facility
SPIE Involvement:
Author
Area of Expertise:
Photolithography , Mask Making , Process Integration , CAD , Simulation , Advanced Lithography
Websites:
Company Website
Publications (1)
SPIE Journal Paper | 2 August 2013 Open Access
Periodic patterning using aerial image modulation with optical lithography
Boyan Penkov, Garry Bordonaro, Andrii Golovin, Igor Bendoym, Donald Tennant, David Crouse
JM3, Vol. 12, Issue 03, 033009, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.033009
KEYWORDS: Optical lithography, Photoresist materials, Modulation, Lithography, Etching, Photomasks, Semiconducting wafers, Reflectivity, Plasmons, Silicon
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