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Geunjong Yu
at Dongjin Semichem Co Ltd
SPIE Involvement:
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Publications (1)
Proceedings Article | 23 March 2007 Paper
Effect of deprotection activation energy on lithographic performance of EUVL resist
Proceedings Volume 6519, 651947 (2007) https://doi.org/10.1117/12.711951
KEYWORDS: Polymers, Line edge roughness, Lithography, Diffusion, Extreme ultraviolet lithography, Molecules, Image resolution, Photoresist processing, Reflectivity, Image processing
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