Mr. Hrishi Shende Profile

Hrishi Shende

Engineer at MP Mask Technology Ctr LLC

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Author

Publications (6)

Proceedings Article | 28 June 2013 Paper

Megasonic cleaning: effect of dissolved gas properties on cleaning

Hrishi Shende, Sherjang Singh, James Baugh, Uwe Dietze, Peter Dress

Proceedings Volume 8701, 870105 (2013) https://doi.org/10.1117/12.2029883

KEYWORDS: Argon, Acoustics, Cavitation, Photomasks, SRAF, Stereolithography, Liquids, Energy transfer, Particles, Gases

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Proceedings Article | 8 November 2012 Paper

Controlling MegaSonic performance by optimizing cleaning media's physical and gaseous properties

Hrishi Shende, SherJang Singh, James Baugh, Uwe Dietze, Peter Dress

Proceedings Volume 8522, 852217 (2012) https://doi.org/10.1117/12.979342

KEYWORDS: Chemistry, Acoustics, Stereolithography, Cavitation, Particles, Photomasks, Liquids, SRAF, Inspection, Ions

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Proceedings Article | 14 October 2011 Paper

Megasonic cleaning: possible solutions for 22nm node and beyond

Hrishi Shende, Sherjang Singh, James Baugh, Raunak Mann, Uwe Dietze, Peter Dress

Proceedings Volume 8166, 816614 (2011) https://doi.org/10.1117/12.898409

KEYWORDS: Acoustics, Energy transfer, Photomasks, Cavitation, Sonoluminescence, Particles, SRAF, Chemistry, Gases, Interfaces

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Proceedings Article | 29 March 2007 Paper

Experimental and simulation investigations of acoustic cavitation in megasonic cleaning

Krishna Muralidharan, Manish Keswani, Hrishikesh Shende, Pierre Deymier, Srini Raghavan, Florence Eschbach, Archita Sengupta

Proceedings Volume 6517, 65171E (2007) https://doi.org/10.1117/12.712464

KEYWORDS: Acoustics, Cavitation, Acoustic cavitation, Transducers, Liquids, Chemical species, Semiconducting wafers, Sonoluminescence, Photons, Photomasks

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Proceedings Article | 20 May 2006 Paper

Megasonic cleaning, cavitation, and substrate damage: an atomistic approach

Vivek Kapila, Pierre Deymier, Hrishikesh Shende, Viraj Pandit, Srini Raghavan, Florence Eschbach

Proceedings Volume 6283, 628324 (2006) https://doi.org/10.1117/12.681771

KEYWORDS: Cavitation, Liquids, Acoustics, Chemical species, Particles, Photomasks, Systems modeling, Extreme ultraviolet, Argon, Acoustic cavitation

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Proceedings Article | 8 November 2005 Paper

Acoustic streaming effects in megasonic cleaning of EUV photomasks: a continuum model

Vivek Kapila, Pierre Deymier, Hrishikesh Shende, Viraj Pandit, Srini Raghavan, Florence Eschbach

Proceedings Volume 5992, 59923X (2005) https://doi.org/10.1117/12.633378

KEYWORDS: Particles, Acoustics, Photomasks, Interfaces, Extreme ultraviolet lithography, Silica, Extreme ultraviolet, Cavitation, Microfluidics, Wave propagation

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Showing 5 of 6 publications

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