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Hyung Joo Lee
at Univ of Texas at Austin
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Publications (1)
Proceedings Article | 22 March 2008 Paper
Advanced profile control and the impact of sidewall angle at gate etch for critical nodes
Hyung Lee, Alok Ranjan, Dan Prager, Kenneth Bandy, Eric Meyette, Radha Sundararajan, Anita Viswanathan, Asao Yamashita, Merritt Funk
Proceedings Volume 6922, 69220T (2008) https://doi.org/10.1117/12.774962
KEYWORDS: Etching, Critical dimension metrology, Control systems, Semiconducting wafers, Process control, Scatterometry, Metrology, Diffractive optical elements, Mathematical modeling, Oxygen
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