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Jagadish Salunke
at PictM Technologies Oy
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Publications (1)
Proceedings Article | 9 April 2024 Presentation + Paper
Designing EUV negative tone resist and underlayer approaches exhibiting 14nm half-pitch resolution
Luong Nguyen Dang, Li-Ting Tseng, Anil Rajak, Thomas Gädda, Markus Laukkanen, Jagadish Salunke, Shima Moosakkani, Jyri Paulasaari, Juha Rantala, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci
Proceedings Volume 12957, 129570I (2024) https://doi.org/10.1117/12.3014297
KEYWORDS: Electron beam lithography, Solubility, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon, Polymers, Line width roughness, Photoresist materials, Lithography, Spin on carbon materials
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