Mr. Jisun Ryu Profile

Jisun Ryu

at Hynix Semiconductor Inc

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 11 May 2009 Paper

Evaluation for EAPSM life time by ArF pellicle characteristic

Kang Joon Seo, Ji Sun Ryu, Goo Min Jeong, Shin Cheol Kang, Yong Dae Kim, Sang Chul Kim, Chang Yeol Kim

Proceedings Volume 7379, 73791S (2009) https://doi.org/10.1117/12.824304

KEYWORDS: Pellicles, Photomasks, Air contamination, Transmittance, Contamination, Semiconducting wafers, Lithography, Inspection, Critical dimension metrology, Fluorine

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Proceedings Article | 17 October 2008 Paper

Report of latent contamination factors inducing lithographic variation

Jin Ho Ryu, Kang Joon Seo, Ji Sun Ryu, Chang Yeol Kim

Proceedings Volume 7122, 712215 (2008) https://doi.org/10.1117/12.801433

KEYWORDS: Contamination, Photomasks, Pellicles, Lithography, Air contamination, Quartz, 193nm lithography, Transmittance, Semiconducting wafers, Critical dimension metrology

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Proceedings Article | 17 October 2008 Paper

Simulation analysis of backside defects printability in 193nm photolithography

Jisun Ryu, Dongwook Lee, Jinho Ryu, Sookyeong Jeong, SangPyo Kim, Changyeol Kim

Proceedings Volume 7122, 712218 (2008) https://doi.org/10.1117/12.801437

KEYWORDS: Photomasks, Semiconducting wafers, Optical lithography, Opacity, Fiber optic illuminators, Solids, Coherence (optics), Critical dimension metrology, Lithography, Printing

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Proceedings Article | 30 October 2007 Paper

Capability of eco-friendly cleaning strategy corresponding to advanced technology

Sookyeong Jeong, Dongwook Lee, Jisun Ryu, Jinho Ryu, Sangpyo Kim, Oscar Han

Proceedings Volume 6730, 673018 (2007) https://doi.org/10.1117/12.746782

KEYWORDS: Ultraviolet radiation, Air contamination, Particles, Photomasks, Ions, Chromium, Molecules, Metrology, Critical dimension metrology, Reflectivity

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