Dr. Katsumi Setoguchi Profile

Dr. Katsumi Setoguchi

at Hitachi High-Tech Corp

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Publications (3)

Proceedings Article | 29 March 2019 Presentation + Paper

What is prevalent CD-SEM's role in EUV era?

Zhigang Wang, Yoshinori Momonoi, Katsumi Setoguchi, Makoto Suzuki, Satoru Yamaguchi

Proceedings Volume 10959, 1095914 (2019) https://doi.org/10.1117/12.2514697

KEYWORDS: Metrology, Extreme ultraviolet, Image processing, Stochastic processes, Scanning electron microscopy, Semiconducting wafers, Extreme ultraviolet lithography, Process control, Lithography, Error analysis

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Proceedings Article | 18 April 2013 Paper

High accuracy CD matching monitor for CD-SEM beyond 20nm process

K. Ueda, T. Mizuno, K. Setoguchi

Proceedings Volume 8681, 868135 (2013) https://doi.org/10.1117/12.2011389

KEYWORDS: Critical dimension metrology, Time metrology, Semiconducting wafers, Contamination, Precision measurement, Data corrections, Process control, Semiconductors, Metrology, Image resolution

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Proceedings Article | 10 May 2005 Paper

Development of beam-tilt angle calibration method for CD-SEM

Katsumi Setoguchi, Hidetoshi Morokuma, Atsushi Miyamoto, Maki Tanaka

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.602010

KEYWORDS: Statistical analysis, Semiconducting wafers, Distortion, Image processing, Scanning electron microscopy, Calibration, Beam analyzers, Ridge detection, Detection and tracking algorithms, Process control

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