Nanoimprint lithography is the simple method using stamp and UV or thermal curable resins for nano-structures/patterns with low cost, high-throughput, and high resolution. Residual-layer free NIL provides good performance of micro/nano-scale structures functional arrangements with 2/3D layouts. We demonstrated nanohole patterns of 200 nm pore size using residual-layer-free NIL without further process for removing residual layers for reflectance biosensor. The reflectance peaks of gold substrate are enhanced to 8 times using the hexagonal hole patterns of diameter 200 nm, and pitch 400 nm. So, this substrate can be applied for immune reflectance biosensor with magnetic nanoparticles for pre-treatment.
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