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Lance Lin
at Applied Materials Taiwan Ltd
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Publications (1)
Proceedings Article | 22 November 2023 Poster
The process-footprint and density-dependent errors correction of laser mask pattern generator with software-based data path for cd uniformity improvement
Proceedings Volume PC12751, PC127510X (2023) https://doi.org/10.1117/12.2687188
KEYWORDS: Critical dimension metrology, Beam path, Error control coding, Photoresist materials, Integration, Etching, Design and modelling
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