This paper reports the design procedure of planar lightwave interleavers based on Echelle gratings structure, introduces
two methods to eliminate the device aberration, two-point aberration-free design and elliptical grating facets design.
Simulation results show that the device insertion loss and crosstalk can be effectively reduced by aberration
compensation design. Design example is given in this paper. The 50/100GHz and 100/200GHz interleavers are
fabricated on the SOI (Silicon-on-insulator) materials. As compared to other solutions, they are smaller and compact in
structure.
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