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Liu Liu
at KLA China
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Publications (1)
Proceedings Article | 26 May 2022 Presentation + Paper
Overlay stability control in IBO measurement using rAIM target
Nahee Park, Dohwa Lee, Liu Liu, Xuefei Zhou, Hongpeng Su, Dongsub Choi, Wayne Zhou, Hedvi Spielberg, Efi Megged, Chen Dror, Diana Shaphirov, Zephyr Liu, Mark Ghinovker, Dongyoung Lee, Hongbok Yeon, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee
Proceedings Volume 12053, 120530E (2022) https://doi.org/10.1117/12.2608053
KEYWORDS: Overlay metrology, Process control, Optical lithography, Metrology, Inspection, Semiconducting wafers, Data modeling, Wafer-level optics, Optical properties, Optical design
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