KEYWORDS: Metrology, Manufacturing, Photomasks, Atomic force microscopy, 3D metrology, Lithography, Holography, Nanostructures, Control systems, Fabrication
Eliminating the need for multilayer alignment in nanoscale manufactured devices will streamline the lithography process and open up avenues for flexible substrate roll-to-roll (R2R) manufacturing. A system capable of single-exposure 3D holographic lithography with in-line metrology and real-time feedback will revolutionize micro and nano manufacturing. Work towards such developments are demonstrated to show promise in the field of nanopatterning.
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