Dr. Mark Dineen
at Oxford Instruments Plasma Technology Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 23 March 2020 Paper
Mark Dineen, Matthew Loveday, Andy Goodyear, Mike Cooke, Andrew Newton, Stephanie Baclet, Craig Ward, Tania Hemakumara
Proceedings Volume 11329, 113290I (2020) https://doi.org/10.1117/12.2558732
KEYWORDS: Etching, Gallium nitride, Plasma, Semiconducting wafers, Argon, Reactive ion etching, Field effect transistors, Chlorine

Proceedings Article | 20 February 2007 Paper
Proceedings Volume 6474, 64740P (2007) https://doi.org/10.1117/12.714048
KEYWORDS: Etching, Zinc oxide, Plasma, Plasma etching, Scanning electron microscopy, Plasma systems, Gases, Ions, Silicon, Photoresist materials

Proceedings Article | 12 May 2004 Paper
Proceedings Volume 5280, (2004) https://doi.org/10.1117/12.520922
KEYWORDS: Etching, Photoresist materials, Ions, Electrodes, Semiconducting wafers, Photomasks, Plasma, Chemistry, Plasma systems, Dry etching

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