Mr. Michael Rattner Profile

Michael Rattner

Process Engineer/MEMS Specialist at AdvancedMEMS

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 30 March 2007 Paper

Novel developers for positive tone EUV photoresists

Geeta Sharma, Shalini Sharma, Michael Rattner, Robert Meagley, Masato Tanaka, Tsutomu Shimokawa, Hikaru Sugita, Tina Wang, Atsushi Shiota

Proceedings Volume 6519, 65190P (2007) https://doi.org/10.1117/12.712377

KEYWORDS: Standards development, Photoresist developing, Photoresist materials, Extreme ultraviolet lithography, Photoresist processing, Extreme ultraviolet, Polymers, Scanning electron microscopy, Semiconducting wafers, Solids

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years