Dr. Nassima Zeggaoui Profile

Dr. Nassima Zeggaoui

Technical Manager Advanced Solutions at Siemens EDA

SPIE Involvement:

Author

Proceedings Article | 10 April 2024 Presentation + Paper

Fast full chip curvilinear MRC for advanced manufacturing nodes

Nassima Zeggaoui, Rachit Sharma, Junjiang Lei, Ingo Bork

Proceedings Volume 12954, 1295417 (2024) https://doi.org/10.1117/12.3011100

KEYWORDS: Photomasks, Resolution enhancement technologies, SRAF, Optical proximity correction, Manufacturing, Lithography, Tunable filters, Industry, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 21 November 2023 Poster + Paper

A study of applying mask process correction to constant width curvilinear SRAFs

Mary Zuo, Kushlendra Mishra, Rachit Sharma, Ingo Bork, Nassima Zeggaoui

Proceedings Volume 12751, 127511F (2023) https://doi.org/10.1117/12.2687892

KEYWORDS: SRAF, Optical proximity correction, Bias correction, Printing, Semiconducting wafers, Histograms, Model-based design, Design and modelling, Manufacturing, Industry

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Proceedings Article | 1 December 2022 Presentation + Paper

A study of ILT-based curvilinear SRAF with a constant width

Y. Xu, J. Hou, N. Zeggaoui, Y. Sun, J. Lei

Proceedings Volume 12293, 1229306 (2022) https://doi.org/10.1117/12.2642989

KEYWORDS: SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Printing, Model-based design, Lithography, Extreme ultraviolet, Resolution enhancement technologies, Process modeling

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Proceedings Article | 22 February 2021 Presentation + Paper

Advanced ILT solutions to manufacture photonics designs

Nassima Zeggaoui, Alexander Tritchkov, Sergey Kobelkov

Proceedings Volume 11613, 116130M (2021) https://doi.org/10.1117/12.2585172

KEYWORDS: Design for manufacturability, Manufacturing, Resolution enhancement technologies, Photonics, Visualization, Telecommunications, Optics manufacturing, Optical interconnects, New and emerging technologies, Microelectronics

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Proceedings Article | 24 March 2017 Presentation + Paper

Si-photonics waveguides manufacturability using advanced RET solutions

N. Zeggaoui, B. Orlando, G. Kerrien, V. Farys, E. Yesilada, S. Cremer, A. Tritchkov, V. Liubich

Proceedings Volume 10147, 1014711 (2017) https://doi.org/10.1117/12.2257906

KEYWORDS: Optical proximity correction, Waveguides, Photomasks, Optical lithography, Photonic integrated circuits, Lithography, Manufacturing, Resolution enhancement technologies, SRAF, Photonic devices, Etching, Semiconducting wafers

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Proceedings Article | 4 September 2015 Paper

Enabling the 14nm node contact patterning using advanced RET solutions

N. Zeggaoui, G. Landie, A. Villaret, V. Farys, E. Yesilada, A. Tritchkov, J. Word

Proceedings Volume 9661, 96610Q (2015) https://doi.org/10.1117/12.2193772

KEYWORDS: Photomasks, Liquid phase epitaxy, Optical proximity correction, Lithography, Resolution enhancement technologies, SRAF, Semiconducting wafers, Optical lithography, Visualization, Manufacturing

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Proceedings Article | 23 March 2011 Paper

Improving double patterning flow by analyzing the diffractive orders in the pupil plane

N. Zeggaoui, V. Farys, M. Besacier, Q. Li, E. Yesilada, Y. Trouiller

Proceedings Volume 7973, 79730M (2011) https://doi.org/10.1117/12.879399

KEYWORDS: Photomasks, Double patterning technology, Lithography, Source mask optimization, Image acquisition, Diffraction, Geometrical optics, Optical lithography, Logic, Optical imaging

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Proceedings Article | 23 March 2011 Paper

Enabling 22-nm logic node with advanced RET solutions

V. Farys, L. Depre, J. Finders, V. Arnoux, Y. Trouiller, H. Y. Liu, E. Yesilada, N. Zeggaoui, C. Alleaume

Proceedings Volume 7973, 79730T (2011) https://doi.org/10.1117/12.870753

KEYWORDS: Lithography, Etching, Double patterning technology, Optical lithography, Critical dimension metrology, Resolution enhancement technologies, Photomasks, SRAF, Image processing, Logic

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Proceedings Article | 25 September 2010 Paper

Optimization of double patterning split by analyzing diffractive orders in the pupil plane

N. Zeggaoui, V. Farys, Y. Trouiller, E. Yesilada, F. Robert, M. Besacier

Proceedings Volume 7823, 78233Y (2010) https://doi.org/10.1117/12.869759

KEYWORDS: Double patterning technology, Diffraction, Image acquisition, Source mask optimization, Lithography, Photomasks, Feature extraction, Optical lithography, Integrated circuits, Semiconducting wafers

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Proceedings Article | 30 September 2009 Paper

Resolving contact conflict for double patterning split

N. Zeggaoui, V. Farys, Y. Trouiller, E. Yesilada, F. Robert, J. Belledent, M. Besacier

Proceedings Volume 7488, 74882K (2009) https://doi.org/10.1117/12.829762

KEYWORDS: Double patterning technology, Photomasks, Optical proximity correction, Source mask optimization, Optical lithography, Design for manufacturing, Feature extraction, Design for manufacturability, Optics manufacturing, Lithography

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Showing 5 of 10 publications

Conference Committee Involvement (1)

40th European Mask and Lithography Conference (EMLC 2025)

16 June 2025 | Dresden, Germany

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