Integrated photonics has the potential of fabricating a diverse set of photonic systems on a single substrate. At
nanoscales (< 100 nm), the properties of material depend on quantum confinements. The challenge is to integrate these
unique properties of nanostructures into low-cost manufacturing. For material deposition, a photo-assisted monolayer
deposition technique can provide nanomaterials with an ultra-low defect density. Epitaxial dielectrics offer the
possibility of growing defect-free optical materials including compound semiconductors on silicon substrates. In this
paper, we have also provided manufacturing directions that must be incorporated for developing the next generation of
integrated photonics.
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