Mr. Pierre L. Leroux Profile

Pierre L. Leroux

at Maxim Integrated

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Author

Publications (4)

Proceedings Article | 16 July 2002 Paper

Linear alignment correction algorithm for deep-submicron lithography

David Ziger, Pierre Leroux

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473434

KEYWORDS: Semiconducting wafers, Optical alignment, Calibration, Data modeling, Lithography, Diffractive optical elements, Reticles, Distortion, Silicon, Overlay metrology

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SPIE Journal Paper | 1 July 2000

Understanding optical end of line metrology

David Ziger, Pierre Leroux

OE, Vol. 39, Issue 07, (July 2000) https://doi.org/10.1117/12.10.1117/1.602580

KEYWORDS: Scanning electron microscopy, Optical testing, Metrology, Solids, Optical metrology, Diffraction, Diffraction gratings, Wafer-level optics, Optical alignment, Reflectivity

Proceedings Article | 14 June 1999 Paper

Understanding optical end of line metrology

David Ziger, Pierre Leroux

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350807

KEYWORDS: Error analysis, Image quality, Scanning electron microscopy, Optical testing, Metrology, Photomasks, Solids, Wafer-level optics, Optical alignment, Semiconducting wafers

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Proceedings Article | 7 July 1997 Paper

Complementary alignment metrology: a visual technique for alignment monitoring

David Ziger, Pierre Leroux

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275959

KEYWORDS: Semiconducting wafers, Optical alignment, Matrices, Visualization, Error analysis, Metrology, Photomasks, Eye, Standards development, Wafer-level optics

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