Dr. Ralf Gehrke Profile

Dr. Ralf Gehrke

Assistant Scientist at Carl Zeiss SMT GmbH

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Publications (2)

Proceedings Article | 23 October 2018 Presentation + Paper

AIMS™ EUV tool platform: aerial-image based qualification of EUV masks

Renzo Capelli, Martin Dietzel, Dirk Hellweg, Grizelda Kersteen, Ralf Gehrke, Markus Bauer

Proceedings Volume 10810, 108100V (2018) https://doi.org/10.1117/12.2501379

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Image processing, Metrology, 3D image processing, High volume manufacturing, 193nm lithography, Lithography, Reflectivity

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Proceedings Article | 16 October 2017 Paper

Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production

Dirk Hellweg, Martin Dietzel, Renzo Capelli, Conrad Wolke, Grizelda Kersteen, Markus Koch, Ralf Gehrke

Proceedings Volume 10451, 104510J (2017) https://doi.org/10.1117/12.2280689

KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Stochastic processes, Extreme ultraviolet lithography, Scanners, 3D metrology, Line width roughness, Manufacturing, Lithography

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