Driven by the ever-growing storage density needs, the hard-disk drive (HDD) industry is transitioning to patterned
magnetic media. For the first time, magnetic media disk production will require advanced lithography and critical
dimension (CD) process control. The CDs of patterned media features will have to be smaller than the most advanced
semiconductor design rules, and nano-imprint lithography (NIL) is the only candidate to yield such small dimensions at
the low cost the industry demands. After an introduction to the industry's drivers for the transition, we give a summary
of the NIL process for HDD media production, and an estimate of the CD metrology requirements for future process
control. We then present some arguments and results to illustrate how a spectroscopic ellipsometry based scatterometry
technique could be a good candidate to meet the CD control requirements of the patterned media roadmap. Simulations
and experimental results on several DTM structures, for both template and disk imprints are discussed.
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