Mr. Shengen Zhang Profile

Shengen Zhang

at Beijing Univ of Technology

SPIE Involvement:

Author

Publications (5)

SPIE Journal Paper | 31 October 2024

Robust source and polarization joint optimization for thick-mask lithography imaging

Shengen Zhang, Xu Ma, Gonzalo Arce

JM3, Vol. 23, Issue 04, 043201, (October 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.043201

KEYWORDS: Polarization, Mathematical optimization, Lithography, Image processing, Imaging systems, Algorithm development, Printing, Light sources and illumination, Diffraction, Matrices

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Proceedings Article | 18 July 2024 Paper

Mask correction for DMD-based lithography testbed with calibrated imaging model

Chaojun Huang, Xu Ma, Shengen Zhang, Jingwen Lei

Proceedings Volume 13179, 131791F (2024) https://doi.org/10.1117/12.3031601

KEYWORDS: Calibration, Lithography, Imaging systems, Digital micromirror devices, Data modeling, Convolution

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SPIE Journal Paper | 7 September 2023

Classification method of lithographic layout patterns based on graph convolutional network with graph attention mechanism

Junbi Zhang, Xu Ma, Shengen Zhang

JM3, Vol. 22, Issue 03, 034202, (September 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.034202

KEYWORDS: Matrices, Image classification, Lithography, Education and training, Convolution, Machine learning, Signal processing, Deep learning, Mathematical optimization, Data modeling

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Proceedings Article | 22 February 2021 Poster + Paper

Fast optical proximity correction based on graph convolution network

Shengen Zhang, Xu Ma, Junbi Zhang, Rui Chen, Yihua Pan, ChengZhen Yu, Lisong Dong, Yayi Wei, Gonzalo Arce

Proceedings Volume 11613, 116130V (2021) https://doi.org/10.1117/12.2583773

KEYWORDS: Optical proximity correction, Signal processing, Convolution, Imaging systems, Systems modeling, Photomasks, Optimization (mathematics), Machine learning, Lithography, Integrated circuits

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Proceedings Article | 22 February 2021 Poster + Paper

Lithography layout classification based on graph convolution network

Junbi Zhang, Xu Ma, Shengen Zhang, Xianqiang Zheng, Rui Chen, Yihua Pan, Lisong Dong, Yayi Wei, Gonzalo Arce

Proceedings Volume 11613, 116130U (2021) https://doi.org/10.1117/12.2583558

KEYWORDS: Lithography, Convolution, Signal processing, Network architectures, Image classification, Transform theory, Source mask optimization, Machine learning, Integrated circuits, Fourier transforms

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