Shimoaoki Takeshi
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 March 2020 Paper
Y. C. Lin, Mifong Wu, Le Wang, Baijun Sun, Hiroki Ohtaguro, Takeshi Shimoaoki, Yusaku Hashimoto, Koichi Hontake
Proceedings Volume 11326, 1132620 (2020) https://doi.org/10.1117/12.2551835
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Image processing, Particles, Manufacturing, Inspection, Photomasks, Arsenic, Extreme ultraviolet lithography, Etching

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