Mr. Shu-Hao Chang Profile

Shu-Hao Chang

at Inpria Corp

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Author

Publications (5)

Proceedings Article | 9 April 2024 Paper

An update on the improvement in optimization of point-of-use filtration of metal oxide photoresists

T. Kohyama, K. Choudry, Jan Doise, Shu-Hao Chang, Michael Kocsis, Peter De Schepper, Philippe Foubert

Proceedings Volume 12957, 129571J (2024) https://doi.org/10.1117/12.3009767

KEYWORDS: Tunable filters, Metal oxides, Bridges, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Optical lithography, Defect inspection, Wafer inspection

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Proceedings Article | 1 May 2023 Presentation + Paper

Continued optimization of point-of-use filtration for metal oxide photoresists to reduce defect density

T. Kohyama, Shu-Hao Chang, Jan Doise, Michael Kocsis, Peter De Schepper, Philippe Foubert

Proceedings Volume 12498, 124980A (2023) https://doi.org/10.1117/12.2657509

KEYWORDS: Tunable filters, Metal oxides, Particles, Bridges, Extreme ultraviolet, Photoresist materials, Extreme ultraviolet lithography, Semiconducting wafers, Contamination, Quantum processes

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Proceedings Article | 22 February 2021 Presentation

Advances in defect performance in metal oxide photoresists for EUV lithography

Stephen Meyers, Jan Doise, Michael Kocsis, Shu-Hao Chang, Benjamin Clark, Peter De Schepper, Jason Stowers, Alan Telecky, Andrew Grenville, Amrit Narasimhan, Danilo De Simone, Geert Vandenberghe, Philippe Foubert, Poulomi Das, Christophe Beral, Yannick Feurprier, Tomoya Onitsuka

Proceedings Volume 11609, 116090K (2021) https://doi.org/10.1117/12.2584769

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Proceedings Article | 22 February 2021 Poster + Paper

Optimization of point-of-use filtration for metal oxide photoresist

Aiwen Wu, Harvey Tang, Gregg Conner, Shu Hao Chang, Gaetano Giordano, Dominick Smiddy, Mark Geniza, Benjamin Clark

Proceedings Volume 11612, 116120X (2021) https://doi.org/10.1117/12.2583842

KEYWORDS: Oxides, Metals, Extreme ultraviolet, Photoresist materials, Semiconducting wafers, Extreme ultraviolet lithography, Particles, Manufacturing, Chemically amplified resists

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Proceedings Article | 5 May 2020 Paper

Defect improvement for an EUV process

Masahiko Harumoto, Harold Stokes, Shu Hao Chang, Moeen Ghafoor, Brian Cardineau, Jason Stowers, Michael Kocsis, Stephen Meyers, Pieter Vanelderen, Saika Muntaha Bari

Proceedings Volume 11323, 1132322 (2020) https://doi.org/10.1117/12.2552918

KEYWORDS: Extreme ultraviolet, Photoresist materials, Scanning electron microscopy, Metals, Photoresist processing, Semiconducting wafers, Extreme ultraviolet lithography, Line width roughness, Manufacturing, System on a chip

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