Shunko Magoshi
at KIOXIA Corp
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 23 August 2021 Paper
Yoshinori Kagawa, Machiko Suenaga, Hikaru Sasaki, Koji Murano, Shunko Magoshi, Ryu Komatsu, Kosuke Takai, Mitsuru Kondo, Hideaki Sakurai, Shingo Kanamitsu
Proceedings Volume 11908, 119080D (2021) https://doi.org/10.1117/12.2603907
KEYWORDS: Forward error correction, Critical dimension metrology, Nanoimprint lithography, Double patterning technology, Lithography, Scanning electron microscopy, Nanolithography, Image processing, Semiconducting wafers, Etching

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10957, 109571C (2019) https://doi.org/10.1117/12.2515273
KEYWORDS: Photomasks, Extreme ultraviolet, Tantalum, Semiconducting wafers, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Lithographic illumination, Line width roughness, Line edge roughness

Proceedings Article | 18 March 2016 Paper
Satoshi Tanaka, Shunko Magoshi, Hidemi Kawai, Soichi Inoue, Wylie Rosenthal, Luc Girard, Lou Marchetti, Bob Kestner, John Kincade
Proceedings Volume 9776, 97761N (2016) https://doi.org/10.1117/12.2219368
KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Process control, Photomasks, Lithography, Optical design, Projection systems, Polarization, Mirrors, Reticles, Semiconducting wafers

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79691L (2011) https://doi.org/10.1117/12.879333
KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Reactive ion etching, Extreme ultraviolet, Lithography, Lithographic illumination, Semiconducting wafers, Yield improvement, Semiconductors, Photoresist processing

Proceedings Article | 5 April 2011 Paper
Yuusuke Tanaka, Kentaro Matsunaga, Shunko Magoshi, Seiichiro Shirai, Kazuo Tawarayama, Hiroyuki Tanaka
Proceedings Volume 7969, 79690Q (2011) https://doi.org/10.1117/12.870332
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Photomasks, Extreme ultraviolet, Wafer-level optics, Modulation, Control systems, Projection systems, Lithography

Proceedings Article | 23 March 2010 Paper
Yuusuke Tanaka, Hajime Aoyama, Kazuo Tawarayama, Shunko Magoshi, Daisuke Kawamura, Kentaro Matsunaga, Takashi Kamo, Yukiyasu Arisawa, Taiga Uno, Hiroyuki Tanaka, Naofumi Nakamura, Eiichi Soda, Noriaki Oda, Shuichi Saito, Ichiro Mori
Proceedings Volume 7636, 76362D (2010) https://doi.org/10.1117/12.846315
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Metals, Extreme ultraviolet, Semiconducting wafers, Critical dimension metrology, Semiconductors, Anisotropy, Error analysis

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 76361O (2010) https://doi.org/10.1117/12.846265
KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Manufacturing, Lithography, Etching, Extreme ultraviolet, Photoresist processing, Reactive ion etching, Silica, Metals

SPIE Journal Paper | 1 October 2009
Kazuo Tawarayama, Hajime Aoyama, Shunko Magoshi, Yuusuke Tanaka, Seiichiro Shirai, Hiroyuki Tanaka
JM3, Vol. 8, Issue 04, 041510, (October 2009) https://doi.org/10.1117/12.10.1117/1.3275786
KEYWORDS: Semiconducting wafers, Optical alignment, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Photoresist processing, Photomasks, Overlay metrology, Image processing, Semiconductors

Proceedings Article | 18 March 2009 Paper
Shunko Magoshi, Seiichiro Shirai, Hideto Mori, Kazuo Tawarayama, Yuusuke Tanaka, Hiroyuki Tanaka
Proceedings Volume 7271, 727135 (2009) https://doi.org/10.1117/12.814004
KEYWORDS: Electrodes, Plasma, Extreme ultraviolet, Semiconducting wafers, Mirrors, Extreme ultraviolet lithography, EUV optics, Optical alignment, Charge-coupled devices, Visible radiation

Proceedings Article | 18 March 2009 Paper
Yuusuke Tanaka, Hajime Aoyama, Shunko Magoshi, Kazuo Tawarayama, Seiichiro Shirai, Hiroyuki Tanaka
Proceedings Volume 7271, 72713S (2009) https://doi.org/10.1117/12.813492
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Lithography, Optical proximity correction, Metals, Semiconducting wafers, Optical lithography, Photography, Scanners

Proceedings Article | 18 March 2009 Paper
Kazuo Tawarayama, Hajime Aoyama, Shunko Magoshi, Yuusuke Tanaka, Seiichiro Shirai, Hiroyuki Tanaka
Proceedings Volume 7271, 727118 (2009) https://doi.org/10.1117/12.813627
KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Optical alignment, Lithography, Overlay metrology, Semiconductors, Manufacturing, Extreme ultraviolet, Metals, Image processing

Proceedings Article | 21 March 2008 Paper
Yuusuke Tanaka, Hajime Aoyama, Kazuo Tawarayama, Shunko Magoshi, Seiichiro Shirai, Hiroyuki Tanaka
Proceedings Volume 6921, 69211D (2008) https://doi.org/10.1117/12.771626
KEYWORDS: Point spread functions, Lithography, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Projection systems, Line width roughness, Mirrors, Surface roughness, Optical testing

Proceedings Article | 21 March 2008 Paper
Kazuo Tawarayama, Shunko Magoshi, Hajime Aoyama, Yuusuke Tanaka, Seiichiro Shirai, Hiroyuki Tanaka
Proceedings Volume 6921, 69212V (2008) https://doi.org/10.1117/12.771891
KEYWORDS: Electrodes, Extreme ultraviolet, Semiconducting wafers, Lithography, Plasma, Extreme ultraviolet lithography, Mirrors, Manufacturing, Xenon, Semiconductors

Proceedings Article | 24 March 2006 Paper
Ryoichi Inanami, Katsumi Kishimoto, Kazuhiro Nakai, Yoshikazu Ichioka, Kiyoshi Kitamura, Ryo Yamada, Shunko Magoshi
Proceedings Volume 6151, 615126 (2006) https://doi.org/10.1117/12.655438
KEYWORDS: Vestigial sideband modulation, Data conversion, Metals, Electron beams, Databases, Front end of line, Back end of line, Electron beam direct write lithography, Lithography, Logic devices

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598923
KEYWORDS: Semiconducting wafers, Metals, Backscatter, Electron beam lithography, Copper, Lithography, Electron beam direct write lithography, Monte Carlo methods, Critical dimension metrology, Tungsten

Proceedings Article | 16 June 2003 Paper
Shunko Magoshi, Shinji Sato, Kazuo Tawarayama, Yasuhiro Makino, Hiromi Niiyama
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483741
KEYWORDS: Metals, Backscatter, Electron beam lithography, Lithography, Silicon, Tungsten, Modulation, Monte Carlo methods, Microelectronics, Aluminum

Proceedings Article | 16 June 2003 Paper
Ryoichi Inanami, Shunko Magoshi, Shouhei Kousai, Atsushi Ando, Tetsuro Nakasugi, Ichiro Mori, Kazuyoshi Sugihara, Akira Miura
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483702
KEYWORDS: Back end of line, Vestigial sideband modulation, Logic devices, Metals, Data processing, Photomasks, Electron beams, Electron beam direct write lithography, Computer aided design, Beam shaping

Proceedings Article | 5 June 1998 Paper
Masamitsu Itoh, Atsushi Ando, Shunko Magoshi, Kiyoshi Hattori
Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309598
KEYWORDS: Critical dimension metrology, Photomasks, Lithography, Scattering, Laser systems engineering, Control systems, Laser scattering, Monte Carlo methods, Beam controllers, Diffusion

Proceedings Article | 24 July 1996 Paper
Shigehiro Hara, Eiji Murakami, Shunko Magoshi, Kiyomi Koyama, Hirohito Anze, Yoji Ogawa, A. Kabeya, S. Ooki, Tamaki Saito, T. Fujii, S. Sakamoto, Hiromi Suzuki, Mitsuhiro Yano, Sadakazu Watanabe
Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245217
KEYWORDS: Data conversion, Computer aided design, Metals, Data processing, Mask making, Boron, Microelectronics, Solids, Chlorine, Algorithm development

Showing 5 of 19 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top