Dr. Siegfried N. Schwarzl Profile

Dr. Siegfried N. Schwarzl

at Infineon Technologies AG

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 23 March 2006 Paper

Defect printability study using EUV lithography

Christian Holfeld, Karsten Bubke, Falk Lehmann, Bruno La Fontaine, Adam Pawloski, Siegfried Schwarzl, Frank-Michael Kamm, Thomas Graf, Andreas Erdmann

Proceedings Volume 6151, 61510U (2006) https://doi.org/10.1117/12.656386

KEYWORDS: Photomasks, Semiconducting wafers, Printing, Photoresist processing, Extreme ultraviolet lithography, Image processing, Scanning electron microscopy, Extreme ultraviolet, Lithography, Projection systems

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Proceedings Article | 6 May 2005 Paper

Comparison of EUV mask architectures by process window analysis

Siegfried Schwarzl, Frank-Michael Kamm, Stefan Hirscher, Klaus Lowack, Wolf-Dieter Domke, Markus Bender, Stefan Wurm, Adam Pawloski, Bruno La Fontaine, Christian Holfeld, Uwe Dersch, Florian Letzkus, Joerg Butschke

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599343

KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Multilayers, Printing, Scanning electron microscopy, Cadmium, Extreme ultraviolet lithography, Binary data, Imaging systems

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Proceedings Article | 6 December 2004 Paper

Comparative study of mask architectures for EUV lithography

Adam Pawloski, Bruno La Fontaine, Harry Levinson, Stefan Hirscher, Siegfried Schwarzl, Klaus Lowack, Frank-Michael Kamm, Markus Bender, Wolf-Dieter Domke, Christian Holfeld, Uwe Dersch, Patrick Naulleau, Florian Letzkus, Joerg Butschke

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569289

KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Reflectors, Cadmium, Critical dimension metrology, Photoresist materials, Scanning electron microscopy

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