Depositing a monolayer of molecules on top of the most important semiconductor material, i.e. silicon, in order to obtain
hybrid heterostructures is the main purpose of this work. Aromatic and heteroaromatic molecules with a vinylic group
reacting with hydrogenated silicon atoms on a Si(100) surface by a radical reaction promoted by heat are studied. The
molecular grafting occurs through the vinylic function while preserving the original molecular structure and molecular
properties. After depositing the organic materials samples are analysed with atomic force microscopy (AFM) in order to
verify the coverage level, film thickness and topographic features.
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