Mr. Tao Ge Profile

Tao Ge

at Wyant College of Optical Sciences

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 20 August 2015 Presentation + Paper

All-polymer based fabrication process for an all-polymer flexible and parallel optical interconnect

Jilin Yang, Tao Ge, Chris Summitt, Sunglin Wang, Tom Milster, Yuzuru Takashima

Proceedings Volume 9556, 95560F (2015) https://doi.org/10.1117/12.2187143

KEYWORDS: Waveguides, Imaging systems, Mirrors, Optical alignment, Phase contrast, Microscopy, Photomasks, Semiconducting wafers, Optical interconnects, Objectives

Read Abstract +

Proceedings Article | 17 April 2015 Paper

Process optimization for a 3D optical coupler and waveguide fabrication on a single substrate using buffer coat material

Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tao Ge, Tom Milster, Yuzuru Takashima

Proceedings Volume 9374, 937415 (2015) https://doi.org/10.1117/12.2080425

KEYWORDS: Waveguides, Mirrors, Photomasks, Optical alignment, Thin film coatings, Lithography, Cladding, Integrated optics, Silicon, Chromium

Read Abstract +

Proceedings Article | 13 March 2015 Paper

High contrast and metal-less alignment process for all-polymer optical interconnect devices

Tao Ge, Jilin Yang, Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tom Milster, Yuzuru Takashima

Proceedings Volume 9374, 93741F (2015) https://doi.org/10.1117/12.2079620

KEYWORDS: Imaging systems, Phase contrast, Optical alignment, Mirrors, Polymers, Lithography, Optical interconnects, Waveguides, Microscopes, Objectives

Read Abstract +

Proceedings Article | 7 March 2014 Paper

Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits

Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tao Ge, Tom Milster, Yuzuru Takashima

Proceedings Volume 8974, 89740C (2014) https://doi.org/10.1117/12.2045234

KEYWORDS: Lithography, Mirrors, Optical circuits, Optical alignment, Photomasks, Fabrication, Integrated optics, Micro optics, Photoresist materials, Double patterning technology

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years