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Taehyoung Lee
at Tongmyong Univ
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Publications (1)
Proceedings Article | 26 November 2012 Paper
Parameters affecting pattern fidelity and line edge roughness under diffraction effects in optical maskless lithography using a digital micromirror device
Proceedings Volume 8557, 855724 (2012) https://doi.org/10.1117/12.2000855
KEYWORDS: Lithography, Diffraction, Digital micromirror devices, Micromirrors, Line edge roughness, Gaussian beams, Maskless lithography, Imaging arrays, Photomasks, Binary data
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