Dr. Tae Kwon Jee
Founder, CEO at Crossait
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 10 April 2024 Presentation + Paper
Taekwon Jee, Joonsang You, Hong-Goo Lee, Seungmo Hong, Jonghoi Cho, Taeseop Lee, Jong-hyun Seo, Michael Shifrin, Ronnie Porat, Amir Rosen, Rohit Kumar Singh, Jeong-Ho Yeo, Younghoon Kim, Jun Park, Byung-Jo Lim, Chan-Hee Kwak
Proceedings Volume 12955, 129550P (2024) https://doi.org/10.1117/12.3010813
KEYWORDS: Overlay metrology, Critical dimension metrology, Metrology, Semiconducting wafers, Stochastic processes, Time metrology, Design, Data modeling, Process control, Optical lithography

Proceedings Article | 27 April 2023 Poster + Paper
Mohamed Ridane, Ivy Chen, Jaden Song, Peter Nikolsky, Kuan-Ming Chen, Shinyeong Lee, Sean Park, Kolos Lin, Yu-Chi Su, Kyoyeon Cho, Ethan Yu, James Park, Abdalmohsen Elmalk, Chih-Hung Hsieh, Alexander Serebryakov, Lei Zhang, Taekwon Jee, Joonsang You, Hong-Goo Lee, Jongmin Park, Jungchan Kim, Sang-Woo Kim, Seungmo Hong, Jaewook Seo
Proceedings Volume 12496, 124963C (2023) https://doi.org/10.1117/12.2659692
KEYWORDS: Metrology, Semiconducting wafers, High volume manufacturing, Line width roughness, Critical dimension metrology, Scanning electron microscopy, Optical lithography, Environmental sensing, Edge detection, Overlay metrology

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12053, PC120530N (2022) https://doi.org/10.1117/12.2613931
KEYWORDS: Overlay metrology, Image processing, Yield improvement, Metrology, Line edge roughness, Process control, Critical dimension metrology, Scanning electron microscopy, Optical lithography, Inspection

Proceedings Article | 22 February 2021 Presentation + Paper
Kuan-Ming Chen, Wolfgang Henke, Ji-Hoon Jung, Ewa Kasperkiewicz, Anita Bouma, Rizvi Rahman, Gratiela Isai, Gwang-Gon Kim, Sotirios Tsiachris, Jae-Doug Yoo, Yuna Park, JaeYoung Park, Jonggeun Won, Nang-Lyeom Oh, Hsin-Yu Chen, WeiTai Lin, Chih-Hung Hsieh, Kuo-Feng Pao, Kyoyeon Cho, Abdalmohsen Elmalk, Sudharshanan Raghunathan, Taekwon Jee, Seung-Uk Jeong, Jeongwoo Jae, Sang-Woo Kim, Dongyoung Lee, Jungchan Kim, WonKwang Ma, Sang-Ho Lee, Chan-Ha Park
Proceedings Volume 11611, 116111V (2021) https://doi.org/10.1117/12.2584149
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Overlay metrology, Optical lithography, Metrology, Visualization, Statistical analysis, Lithography, Graphic design, Etching

Proceedings Article | 20 March 2018 Presentation + Paper
Mark John Maslow, Vadim Timoshkov, Ton Kiers, Tae Kwon Jee, Liesbeth Reijnen, Kaushik Kumar, Marc Demand, Carlos Fonseca, Florin Cerbu, Guillaume Schelcher, Christophe Beral
Proceedings Volume 10587, 1058704 (2018) https://doi.org/10.1117/12.2297345
KEYWORDS: Etching, Semiconducting wafers, Lithography, Diffractive optical elements, Plasma, Optical lithography, Atomic layer deposition, Critical dimension metrology, Image processing, Deposition processes

Proceedings Article | 13 March 2018 Paper
Hidetami Yaegashi, Kyohei Koike, Carlos Fonseca, Fumiko Yamashita, Kumar Kaushik, Shinya Morikita, Kiyohito Ito, Shota Yoshimura, Vadim Timoshkov, Mark Maslow, Tae Kwon Jee, Liesbeth Reijnen, Peter Choi, Mu Feng, Chris Spence, Stijn Schoofs
Proceedings Volume 10586, 1058605 (2018) https://doi.org/10.1117/12.2297661
KEYWORDS: Extreme ultraviolet, Optical lithography, Plasma treatment, Stochastic processes, Extreme ultraviolet lithography, Photomasks, System on a chip, Lithography, Silica, Manufacturing

Proceedings Article | 16 October 2017 Presentation + Paper
Tae Kwon Jee, Vadim Timoshkov, Peter Choi, David Rio, Yu-Cheng Tsai, Hidetami Yaegashi, Kyohei Koike, Carlos Fonseca, Stijn Schoofs
Proceedings Volume 10450, 1045017 (2017) https://doi.org/10.1117/12.2281627
KEYWORDS: Etching, Optical proximity correction, Stochastic processes, Critical dimension metrology, Extreme ultraviolet, Metrology, Photoresist processing, Performance modeling, Error analysis

Proceedings Article | 21 March 2017 Presentation + Paper
Mark Maslow, Vadim Timoshkov, Ton Kiers, Tae Kwon Jee, Peter de Loijer, Shinya Morikita, Marc Demand, Andrew Metz, Soichiro Okada, Kaushik Kumar, Serge Biesemans, Hidetami Yaegashi, Paolo Di Lorenzo, Joost Bekaert, Ming Mao, Christophe Beral, Stephane Larivière
Proceedings Volume 10149, 101490N (2017) https://doi.org/10.1117/12.2257979
KEYWORDS: Semiconducting wafers, Photoresist processing, Source mask optimization, Overlay metrology

Showing 5 of 8 publications
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