We present the fabrication of a kind of hexagonal and triangular cavity mold, which can cast Polymethyl Methacrylate
(PMMA) resonators and couplers. The mold is designed on (111) silicon wafer according to its crystal structure and
anisotropic etching properties in the etchant of ethylene diamine, pyrocatechol, and water (EDP/EPW), forming
sidewalls by six {110} crystal surfaces, which are perpendicular to the (111) plane and constitute precise hexagons and
triangles. The RIE-ICP etching is used to define the depth of the triangle and hexagonal cavities, and the following EDP
etching smoothes the sidewalls of cavities. Only high temperature EDP etching is proved to be able to get smooth
sidewalls. Before etching, the wafer is aligned to the right crystal orientation by pre-etched marks. The etched results of
different geometrical cavities are analyzed and discussed based on the crystal structure.
In the micro-machining process for fabricating optical devices, the fast atomic-beam etching (FABE) or the ion-beam etching (IBE) is used. However, the etch rates of these processes are typically around a few tens nm/min, so the higher etch-rate is strongly required to reduce the processing time. We investigated an etching process of a silicon-dioxide (SiO2) using an electron-beam-excited plasma (EBEP) to realize a novel micro-machining process without any bias-power supply. The EBEP has an excellent potential for applying self-bias to the non-planar thick dielectric materials with the high-density electron beam. In the direct current (DC)-EBEP, the non-uniformity of etching and the thermal damage to photo-resist were observed. To overcome these problems, we have developed a pulse-modulated EBEP, and thus the non-uniformity of etching and the thermal damage were improved. Moreover, the maximum etch-rate of 450 nm/min was obtained and an anisotropy etching was realized. An optical fiber as a non-planar material was etched to demonstrate the application of this process. The clad area was etched for fabricating a core lens. We have found that the pulse-time-modulated EBEP has an excellent potential to realize micro-fabrications of optical fibers with the etch rate several times higher than that of the conventional FABE and IBE processes.
We report small reflecting mirrors with high reflectance, which are fabricated by using square quartz chips. These quartz mirrors are going to be used in the construction of a miniaturized Fabry Perot Interferometer (FPI) with a commercial ring type PZT from Fuji Ceramic Company. The dimension of quartz substrates is 10×10mm with a thickness of 1mm. The high reflectance of mirrors is obtained by depositing multi-layer thin films on quartz substrates. Magnetron RF sputtering machine is used to ensure that the thickness of dielectric coatings can be precisely controlled. These mirrors are measured by SEM and AFM and the reflectance is detected by a visible light spectrometer. The maximum reflectance of these mirrors is about 99.4% on the designed wavelength 553nm. A small FPI set up by this kind of mirror can have a theoretical finesse of 522, and if a PZT resonator with a length of 7.22mm is used, the resolution of this small interferometer can reach 4.06×10-5nm, in another word, the resolving power is 1.36×107.
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