Dr. Terry R. McAfee Profile

Dr. Terry R. McAfee

Researcher at Lawrence Berkeley National Lab

SPIE Involvement:

Author

Publications (12)

SPIE Journal Paper | 16 July 2024

Study of electron-induced chemical transformations in polymers

Maximillian Mueller, Terry McAfee, Patrick Naulleau, Dahyun Oh, Oleg Kostko

JM3, Vol. 23, Issue 04, 041403, (July 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.041403

KEYWORDS: Electrons, Outgassing, Polymethylmethacrylate, Polymers, Film thickness, Chemistry, FT-IR spectroscopy, Semiconducting wafers, Vacuum chambers, Extreme ultraviolet lithography

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Proceedings Article | 10 April 2024 Presentation

Outgassing, bond structure, and thickness in polymers under electron exposure

Maximillian Mueller, Terry McAfee, Patrick Naulleau, Dahyun Oh, Oleg Kostko

Proceedings Volume 12957, 129570C (2024) https://doi.org/10.1117/12.3010981

KEYWORDS: Outgassing, Photoresist materials, Photons, Extreme ultraviolet lithography, Chemical analysis, Silicon, Semiconducting wafers, Polymers, Laser scattering, Film thickness

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SPIE Journal Paper | 8 March 2024

Experimental characterization of model extreme ultraviolet resist materials

Oleg Kostko, Terry McAfee, Jonathan Ma, James Blackwell, Patrick Naulleau

JM3, Vol. 23, Issue 01, 014602, (March 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.014602

KEYWORDS: Electrons, Extreme ultraviolet, Polymers, Photons, Extreme ultraviolet lithography, Absorption, Signal attenuation, Photoemission spectroscopy, Film thickness, Signal intensity

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Proceedings Article | 21 November 2023 Poster + Paper

Study of electron-induced chemical transformations in model resists

Maximillian Mueller, Terry McAfee, Patrick Naulleau, Dahyun Oh, Oleg Kostko

Proceedings Volume 12750, 127500X (2023) https://doi.org/10.1117/12.2686929

KEYWORDS: Electrons, Extreme ultraviolet, Chemical analysis, Polymers, Photoresist materials, Photons, Film thickness, Silicon, Semiconducting wafers, Outgassing

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Proceedings Article | 21 November 2023 Presentation + Paper

Role of resist components in electron emission and capture

Oleg Kostko, Terry McAfee, Patrick Naulleau

Proceedings Volume 12750, 127500K (2023) https://doi.org/10.1117/12.2687332

KEYWORDS: Extreme ultraviolet, Photoemission spectroscopy, Photoacid generators, Extreme ultraviolet lithography, Polymers, Quenching, Photoresist materials, Photons, Molecules, Outgassing

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Proceedings Article | 30 April 2023 Poster

Electron induced chemical transformations in model resist materials

Oleg Kostko, Terry McAfee, Patrick Naulleau

Proceedings Volume 12498, 124981Z (2023) https://doi.org/10.1117/12.2661596

KEYWORDS: Extreme ultraviolet, Photons, Photoresist materials, Thin films, Spectroscopy, Scattering, Polymers, Molecules, Laser scattering, FT-IR spectroscopy

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Proceedings Article | 16 November 2022 Presentation

Experimental characterization of EUV resist materials: photoelectron spectroscopy

Oleg Kostko, Terry McAfee, Patrick Naulleau

Proceedings Volume PC12292, PC1229203 (2022) https://doi.org/10.1117/12.2643179

KEYWORDS: Extreme ultraviolet, Electrons, Photoemission spectroscopy, Photons, Scattering, Optical lithography, Molecules, Data acquisition, Chemistry, Absorption

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Proceedings Article | 25 May 2022 Presentation + Paper

Experimental characterization of EUV resist materials: photoelectron spectroscopy

Oleg Kostko, Terry McAfee, Patrick Naulleau

Proceedings Volume 12055, 1205508 (2022) https://doi.org/10.1117/12.2618260

KEYWORDS: Electrons, Extreme ultraviolet, Silicon, Semiconducting wafers, Polymers, Photoemission spectroscopy, Signal attenuation, Photons, Tin, Absorption

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Proceedings Article | 25 October 2021 Presentation + Paper

Experimental characterization of model resist materials

Oleg Kostko, Terry McAfee, Jonathan Ma, James Blackwell, Patrick Naulleau

Proceedings Volume 11854, 1185407 (2021) https://doi.org/10.1117/12.2600890

KEYWORDS: Electrons, Extreme ultraviolet, Absorption, Polymers, Extreme ultraviolet lithography, Signal attenuation, Mass attenuation coefficient, Polymer thin films, Photoemission spectroscopy, Semiconducting wafers

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Proceedings Article | 22 February 2021 Poster + Presentation

Characterization of secondary electron blur via determination of electron attenuation length

Oleg Kostko, Terry McAfee, Jonathan Ma, Patrick Naulleau

Proceedings Volume 11609, 116091V (2021) https://doi.org/10.1117/12.2586993

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SPIE Journal Paper | 3 May 2019 Open Access

Reconstructing the three-dimensional latent image of extreme ultraviolet resists with resonant soft x-ray scattering

Guillaume Freychet, Isvar Cordova, Terry McAfee, Dinesh Kumar, Ronald Pandolfi, Chris Anderson, Scott Dhuey, Patrick Naulleau, Cheng Wang, Alexander Hexemer

JM3, Vol. 18, Issue 02, 024003, (May 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.024003

KEYWORDS: Scattering, X-rays, 3D image reconstruction, Extreme ultraviolet, X-ray imaging, Extreme ultraviolet lithography, 3D image processing, Modulation, Carbon, Image enhancement

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Proceedings Article | 9 October 2018 Presentation + Paper

Using resonant soft x-ray scattering to image patterns on undeveloped resists

Guillaume Freychet, Isvar Cordova, Terry McAfee, Dinesh Kumar, Ronald Pandolfi, Chris Anderson, Patrick Naulleau, Cheng Wang, Alexander Hexemer

Proceedings Volume 10809, 108090V (2018) https://doi.org/10.1117/12.2502769

KEYWORDS: Scattering, X-rays, Extreme ultraviolet lithography, Modulation, Extreme ultraviolet, Carbon, X-ray imaging, Absorption, 3D image reconstruction, Laser scattering

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Showing 5 of 12 publications

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