3D photolithography has been proposed using a built-in lens mask (BILM), which can form an optical image at an arbitrary focal point without using a lens by reproducing the wavefront formed in space by the complex transmittance of a glass mask, a three-dimensional structure can be formed using the multiple focus function. In this method, the 3D structure is decomposed into multiple seed patterns, and the seed images are exposed as a batch. However, the mutual interference of diffracted light to form the seed patterns causes turbulence in the image formation state, necessitating an optimized design of the mask. In this study, we conducted basic verification experiments for 3D imaging, verified the multiple focus function, reviewed the seed design including automatic optimization of the seed placement in order to first realize 3D image formation and then complex 3D image formation and verify the possibility for typical 3-D structures.
Automatic design systems of the Built-in Lens Mask (BILM) for three-dimensional photo lithography will be presented based on conventional feedback control procedure. The 3Dstructure, which is imaged by BILM sometimes missing the pattern due to optical interferences. By optimization of the BILM mask, the optical image becomes fine, smooth and unity.
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