KEYWORDS: Nanostructures, Electron microscopy, Scattering, Diffraction limit, Diffraction, Optical microscopy, Near field optics, Near field, Multilayers, Modeling
Dimensional optical microscopy allows for the rapid inspection of devices at the cost of limited accuracy. Introducing a model-based approach that includes diffraction effects allows for increased accuracies. The model needs to be efficient and accurate to evaluate the measurements in an acceptable time frame.
We present an overview of the illumination model and different incidence-pupil sampling techniques. Furthermore, we will demonstrate strategies for efficiently calculating the near-field scattering response from structures using the finite element method.
Using these aspects, we demonstrate a significant increase in the accuracy of dimensional estimates for a range of structures.
In this contribution, we present a technique for the determination of optical aberrations, which is based on measurements of the point spread function and a Bayesian optimization of rigorous simulations. The measuring system is a UV-microscope in a reflected light configuration with a 200x magnification, unpolarized light, and an illumination and imaging NA of 0.44 and 0.55, respectively. The PSF is measured by imaging a small quadratic chrome dot (side length ≈ 180 nm) on a glass substrate. We investigate the impact of different adjustment states, different dot locations and different optical microscopes.
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